Development of cluster ion source based on modulated pulse power magnetron sputtering technique

被引：0
|
作者：
Zhang, C. H. [1 ,2 ]
Tsunoyama, H. [1 ,2 ]
Akatsuka, H. [2 ]
Sekiya, H. [2 ]
Nagase, T. [2 ]
Nakajima, A. [1 ,2 ]
机构：
[1] JST ERATO, Nakajima Designer Nanocluster Assembly Project, Kawasaki, Kanagawa, Japan
[2] Keio Univ, Fac Sci & Technol, Dept Chem, Keio, Japan
来源：
2013 8TH ANNUAL IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS (IEEE NEMS 2013) | 2013年
关键词：
modulated pulse power; high power impulse magnetron sputtering; cluster source; mass spectroscopy; MASS; GENERATION; SURFACE; ENERGY; FILMS; DC; TI;
D O I：
暂无
中图分类号：
R318 [生物医学工程];
学科分类号：
0831 ;
摘要：
A new ion source based on modulated pulse power (MPP) magnetron sputtering (MSP) was developed and demonstrated for cluster production. By employing MPP-MSP, both silver and silicon cluster beams were produced and analyzed by a quadrupole mass spectrometer. It is found that the maximum intensity of silver cluster anions reaches 500 pA, which is considerably higher than that with a conventional DC-MSP. For silicon cluster cation, the overall ion intensity of the cluster beam by MPP-MSP is about three times higher than that generated by DC-MSP.
引用
收藏
页码：428 / 431
页数：4
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