Two degrees-of-freedom Lloyd-mirror interferometer for superior pattern coverage area

被引：48
|
作者：
Wathuthanthri, Ishan [1 ]
Mao, Weidong [1 ]
Choi, Chang-Hwan [1 ]
机构：
[1] Stevens Inst Technol, Dept Mech Engn, Hoboken, NJ 07030 USA
来源：
OPTICS LETTERS | 2011年 / 36卷 / 09期
基金：
美国国家科学基金会;
关键词：
LASER INTERFERENCE LITHOGRAPHY; FABRICATION; NANOLITHOGRAPHY; NANOSTRUCTURES;
D O I：
10.1364/OL.36.001593
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
In this study, we have developed a tunable Lloyd-mirror interferometer with two degrees of freedom, in contrast to a traditional system with one degree of freedom. This new Lloyd-mirror interferometer allows an angular rotation of the mirror independently from that of a sample stage, resulting in an increased pattern coverage area with tunable pattern periodicity. Both theoretical and experimental results verify that the tunable characteristic of the modified configuration enhances the nanopatterning capabilities of the Lloyd-mirror interference lithography system especially in achieving greater pattern coverage area for larger pattern periodicities. (C) 2011 Optical Society of America
引用
收藏
页码：1593 / 1595
页数：3
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