Two degrees-of-freedom Lloyd-mirror interferometer for superior pattern coverage area

被引：48

作者：

Wathuthanthri, Ishan ^{[1
]}

Mao, Weidong ^{[1
]}

Choi, Chang-Hwan ^{[1
]}

机构：

[1] Stevens Inst Technol, Dept Mech Engn, Hoboken, NJ 07030 USA

来源：

OPTICS LETTERS | 2011年 / 36卷 / 09期

基金：

美国国家科学基金会;

关键词：

LASER INTERFERENCE LITHOGRAPHY; FABRICATION; NANOLITHOGRAPHY; NANOSTRUCTURES;

D O I：

10.1364/OL.36.001593

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this study, we have developed a tunable Lloyd-mirror interferometer with two degrees of freedom, in contrast to a traditional system with one degree of freedom. This new Lloyd-mirror interferometer allows an angular rotation of the mirror independently from that of a sample stage, resulting in an increased pattern coverage area with tunable pattern periodicity. Both theoretical and experimental results verify that the tunable characteristic of the modified configuration enhances the nanopatterning capabilities of the Lloyd-mirror interference lithography system especially in achieving greater pattern coverage area for larger pattern periodicities. (C) 2011 Optical Society of America

引用

页码：1593 / 1595

页数：3

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