Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films (vol 118, 102901, 2021)

被引：2
|
作者：
Fields, Shelby S. [1 ]
Olson, David H. [2 ]
Jaszewski, Samantha T. [1 ]
Fancher, Chris M. [3 ]
Smith, Sean W. [4 ,8 ]
Dickie, Diane A. [1 ,5 ]
Esteves, Giovanni [4 ]
Henry, M. David [4 ]
Davids, Paul S. [4 ]
Hopkins, Patrick E. [1 ,2 ,6 ]
Ihlefeld, Jon F. [1 ,7 ]
机构：
[1] Univ Virginia, Dept Mat Sci & Engn, Charlottesville, VA 22904 USA
[2] Univ Virginia, Dept Mech & Aerosp Engn, Charlottesville, VA 22904 USA
[3] Oak Ridge Natl Lab, Mat Sci & Technol Div, Oak Ridge, TN 37831 USA
[4] Sandia Natl Labs, Albuquerque, NM 87185 USA
[5] Univ Virginia, Dept Chem, Charlottesville, VA 22904 USA
[6] Univ Virginia, Dept Phys, Charlottesville, VA 22904 USA
[7] Univ Virginia, Charles L Brown Dept Elect & Comp Engn, Charlottesville, VA 22904 USA
[8] Radiant Technol, Albuquerque, NM USA
来源：
APPLIED PHYSICS LETTERS | 2021年 / 119卷 / 12期
基金：
美国国家科学基金会;
关键词：
OXIDE;
D O I：
10.1063/5.0068886
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页数：3
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  • [1] Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films
    Fields, Shelby S.
    Olson, David H.
    Jaszewski, Samantha T.
    Fancher, Chris M.
    Smith, Sean W.
    Dickie, Diane A.
    Esteves, Giovanni
    Henry, M. David
    Davids, Paul S.
    Hopkins, Patrick E.
    Ihlefeld, Jon F.
    [J]. APPLIED PHYSICS LETTERS, 2021, 118 (10)
  • [2] Pyroelectric response in crystalline hafnium zirconium oxide (Hf1-xZrxO2) thin films
    Smith, S. W.
    Kitahara, A. R.
    Rodriguez, M. A.
    Henry, M. D.
    Brumbach, M. T.
    Ihlefeld, J. F.
    [J]. APPLIED PHYSICS LETTERS, 2017, 110 (07)
  • [3] Morphotropic Phase Boundary of Hf1-xZrxO2 Thin Films for Dynamic Random Access Memories
    Park, Min Hyuk
    Lee, Young Hwan
    Kim, Han Joon
    Kim, Yu Jin
    Moon, Taehwan
    Do Kim, Keum
    Hyun, Seung Dam
    Hwang, Cheol Seong
    [J]. ACS APPLIED MATERIALS & INTERFACES, 2018, 10 (49) : 42666 - 42673
  • [4] Thickness scaling of pyroelectric response in thin ferroelectric Hf1-xZrxO2 films
    Smith, Sean W.
    Henry, M. David
    Brumbach, Michael T.
    Rodriguez, Mark A.
    Ihlefeld, Jon F.
    [J]. APPLIED PHYSICS LETTERS, 2018, 113 (18)
  • [5] Influence of Hf→Zr substitution on optical and refractometric parameters of Hf1-xZrxO2 thin films
    Studenyak, IP
    Kranjcec, A
    Nahusko, OT
    Borets, OM
    [J]. THIN SOLID FILMS, 2005, 476 (01) : 137 - 141
  • [6] Microscopic Crystal Phase Inspired Modeling of Zr Concentration Effects in Hf1-xZrxO2 Thin Films
    Saha, A. K.
    Grisafe, B.
    Datta, S.
    Gupta, S. K.
    [J]. 2019 SYMPOSIUM ON VLSI TECHNOLOGY, 2019, : T226 - T227
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  • [8] Local field inhomogeneity and ferroelectric switching dynamics in Hf1-xZrxO2 thin films
    Song, M. S.
    Lee, K. C.
    Choi, J. C.
    Lee, K.
    Chae, S. C.
    [J]. PHYSICAL REVIEW MATERIALS, 2021, 5 (11)
  • [9] Hf1-xZrxO2/ZrO2 Nanolaminate Thin Films as a High-κ Dielectric
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  • [10] Impacts of surface nitridation on crystalline ferroelectric phase of Hf1-xZrxO2 and ferroelectric FET performance
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    [J]. APPLIED PHYSICS LETTERS, 2021, 119 (19)
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