Carrier transport in InxGa1-xN thin films grown by modified activated reactive evaporation

被引:12
|
作者
Meher, S. R. [1 ]
Naidu, R. V. Muniswami [1 ]
Biju, Kuyyadi P. [1 ]
Subrahmanyam, A. [1 ]
Jain, Mahaveer K. [1 ]
机构
[1] Indian Inst Technol, Dept Phys, Madras 600036, Tamil Nadu, India
关键词
METAL-INSULATOR-TRANSITION; ELECTRON-TRANSPORT; CONDUCTIVITY; INN;
D O I
10.1063/1.3630000
中图分类号
O59 [应用物理学];
学科分类号
摘要
In the present work, we report the temperature dependent carrier transport properties of InxGa1-xN thin films in the entire composition range grown by modified activated reactive evaporation. The carrier transport in these degenerate semiconductors is controlled by impurity band conduction. A transition from metallic to semiconducting type resistivity was observed for indium rich films. The semiconducting behavior originates from electron-electron interaction and weak localization, whereas higher temperature scattering contributes to the metallic type resistivity. A transition of resistivity behavior from the quantum phenomena to the classical Arrhenius approach was observed for x = 0.12 film. (C) 2011 American Institute of Physics. [doi:10.1063/1.3630000]
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页数:3
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