Interrupted Mg doping of GaN with MOCVD for improved p-type layers

被引:5
|
作者
Xing, Yanhui [1 ]
Han, Jun [1 ]
Liu, Jianping [1 ]
Niu, Nanhui [1 ]
Deng, Jun [1 ]
Litong [1 ]
Shen, Guangdi [1 ]
机构
[1] Beijing Univ Technol, Beijing Optoelect Technol Lab, Beijing 100022, Peoples R China
关键词
P-GaN; delta-doping; MOCVD; AFM;
D O I
10.1016/j.vacuum.2006.12.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Uniformity doping, delta-doping and growth-interruption doping to produce gallium nitride (GaN): Mg has been investigated by low-pressure metal-organic chemical vapor deposition (LP-MOCVD). It was demonstrated by electrical, optical, and surface studies that films produced by growth-interruption-Mg-doping produce the best crystal quality, this doping method increasing self-compensation because of the incorporation of additional impurities during the interruption period. Mg-delta-doping employs GaN:Mg/UGaN superlattices valence band edge oscillation to enhance hole concentration leading to significantly reduced p-type resistivity, enhanced hole mobility. This doping method also leads to improved surface morphology. (C) 2007 Published by Elsevier Ltd.
引用
收藏
页码:1 / 4
页数:4
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