Electron emission from patterned diamond flat cathodes

被引：3
|
作者：
Tolt, ZL [1 ]
Fink, RL [1 ]
Yaniv, Z [1 ]
机构：
[1] FEPET Inc, Austin, TX 78727 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 03期
关键词：
D O I：
10.1116/1.590032
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A substrate predesposition treatment process is used to pattern and enhance the emission properties of diamond flat cathode films. An advantage of this process is that the diamond grit abrasive process steps are not required for the enhanced emission properties. The predesposition treatment also eliminates the possibility of degrading cathode performance resulting from postgrowth processes.
引用
收藏
页码：1197 / 1198
页数：2
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