A new application for X-ray lithography: Fabrication of blazed diffractive optical elements with a deep phase profile

被引：3
|
作者：
Makarov, OA [1 ]
Chen, Z [1 ]
Krasnoperova, AA [1 ]
Cerrina, F [1 ]
Cherkashin, VV [1 ]
Poleshchuk, AG [1 ]
Koronkevich, VP [1 ]
机构：
[1] ARGONNE NATL LAB,ARGONNE,IL 60439
来源：
ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI | 1996年 / 2723卷
关键词：
X-ray lithography; synchrotron radiation; diffractive optical elements; deep phase profile;
D O I：
10.1117/12.240477
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：261 / 267
页数：7
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