Deep X-ray lithography in the fabrication process of a 3D diffractive optical element

被引：0
|
作者：
Heussler, S. P. [1 ,2 ]
Moser, H. O. [1 ]
Quan, C. G. [2 ]
Tay, C. J. [2 ]
Moeller, K. D. [3 ]
Bahou, M. [1 ]
Jian, L. K. [1 ]
机构：
[1] Natl Univ Singapore, Singapore Synchrotron Ligh Source, 5 Res Link, Singapore 117603, Singapore
[2] Natl Univ Singapore, Dept Mech Engn, Singapore 119260, Singapore
[3] New Jersey Inst Technol, Dept Elect & Comp Engn, Newark, NJ 07102 USA
来源：
SYNCHROTRON RADIATION INSTRUMENTATION, PTS 1 AND 2 | 2007年 / 879卷
关键词：
Diffractive Optical Element; Fourier Transform Spectroscopy; X-ray lithography;
D O I：
暂无
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We present first results of the fabrication process of a diffractive optical element (DOE) using deep X-ray lithography. The DOE forms the core of our proposed fast parallel-processing infrared Fourier transform interferometer (FPP FTIR) that works without moving parts and may allow instantaneous spectral analysis only limited by detector bandwidth. Design and specifications of the DOE are discussed. A fabrication process including deep X-ray lithography (DXRL) on stepped substrates is introduced.
引用
收藏
页码：1503 / +
页数：2
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