A new application for X-ray lithography: Fabrication of blazed diffractive optical elements with a deep phase profile

被引：3
|
作者：
Makarov, OA [1 ]
Chen, Z [1 ]
Krasnoperova, AA [1 ]
Cerrina, F [1 ]
Cherkashin, VV [1 ]
Poleshchuk, AG [1 ]
Koronkevich, VP [1 ]
机构：
[1] ARGONNE NATL LAB,ARGONNE,IL 60439
来源：
ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI | 1996年 / 2723卷
关键词：
X-ray lithography; synchrotron radiation; diffractive optical elements; deep phase profile;
D O I：
10.1117/12.240477
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：261 / 267
页数：7
相关论文
共 50 条
  • [21] Fabrication and application of diffractive optical elements
    Poleshchuk, A. G.
    [J]. 6TH INTERNATIONAL SYMPOSIUM ON PRECISION ENGINEERING MEASUREMENTS AND INSTRUMENTATION, 2010, 7544
  • [22] Diffractive optical elements: fabrication and application
    Poleshchuk, A. G.
    Korolkov, V. P.
    Nasyrov, R. K.
    [J]. 7TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS, 2014, 9283
  • [23] Fabrication of nickel diffractive phase elements for x-ray microscopy at 8 keV photon energy
    Grenci, Gianluca
    Pozzato, Alessandro
    Sovernigo, Enrico
    Prasciolu, Mauro
    Tormen, Massimo
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2012, 30 (03):
  • [24] Application of deep X-ray lithography for fabrication of polymer regular membranes with submicron pores
    Kulipanov, GN
    Makarov, OA
    Mezentseva, LA
    Mishnev, SI
    Nazmov, VP
    Pindyurin, VF
    Skrinsky, AN
    Artamonova, LD
    Cherkov, GA
    Gashtold, VN
    Prokopenko, VS
    Chesnokov, VV
    [J]. ELECTRON-BEAM, X-RAY, EUV, AND ION-BEAM SUBMICROMETER LITHOGRAPHIES FOR MANUFACTURING VI, 1996, 2723 : 268 - 275
  • [25] Generalized conversion from the phase function to the blazed surface-relief profile of diffractive optical elements
    Golub, MA
    [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1999, 16 (05): : 1194 - 1201
  • [26] Fabrication of ceramic microcomponents using deep X-ray lithography
    Müller, C
    Hanemann, T
    Wiche, G
    Kumar, C
    Goettert, J
    [J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2005, 11 (4-5): : 271 - 277
  • [27] High precision mask fabrication for deep X-ray lithography
    Schmidt, A
    Himmelsbach, G
    Lüttge, R
    Adam, D
    Hoke, F
    Schacke, H
    Belic, N
    Hartmann, H
    Burkhard, F
    Wolf, H
    [J]. 16TH EUROPEAN CONFERENCE ON MASK TECHNOLOGY FOR INTEGRATED CIRCUITS AND MICROCOMPONENTS, 2000, 3996 : 235 - 243
  • [28] Fabrication of ceramic microcomponents using deep X-ray lithography
    C. Müller
    T. Hanemann
    G. Wiche
    C. Kumar
    J. Goettert
    [J]. Microsystem Technologies, 2005, 11 : 271 - 277
  • [29] Fabrication of absorption gratings with X-ray lithography for X-ray phase contrast imaging
    Wang, Bo
    Wang, Yu-Ting
    Yi, Fu-Ting
    Zhang, Tian-Chong
    liu, Jing
    Zhou, Yue
    [J]. INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2018, 32 (13):
  • [30] Dosage modeling for deep x-ray lithography application
    Shih, WP
    Hwang, GJ
    Shew, BY
    Cheng, Y
    [J]. MICROSYSTEM TECHNOLOGIES, 1998, 4 (02) : 82 - 85
12345