A metrology of silicon film thermal conductivity using micro-Raman spectroscopy

被引：0
|
作者：
Liu, Xi [1 ,2 ]
Wu, Xiaoming [1 ,2 ]
Ren, Tianling [1 ,2 ]
机构：
[1] Tsinghua Univ, Inst Microelect, Beijing 100084, Peoples R China
[2] Tsinghua Univ, Tsinghua Natl Lab Informat Sci & Technol, Beijing 100084, Peoples R China
来源：
2010 IEEE INTERNATIONAL SOI CONFERENCE | 2010年
关键词：
THIN-FILMS; DYNAMICS; LAYERS;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页数：2
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