100W EUV light source key component technology update for HVM

被引：8
|
作者：
Hori, Tsukasa [1 ]
Kawasuji, Yasufumi [1 ]
Tanaka, Hiroshi [1 ]
Watanabe, Yukio [1 ]
Shiraishi, Yutaka [1 ]
Abe, Tamotsu [1 ]
Okamoto, Takeshi [1 ]
Kodama, Takeshi [1 ]
Nakarai, Hiroaki [1 ]
Yamazaki, Taku [1 ]
Okazaki, Shinji [1 ]
Saitou, Takashi [1 ]
Mizoguchi, Hakaru [1 ]
机构：
[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan
来源：
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII | 2016年 / 9776卷
关键词：
EUV light source; EUV lithography; Laser Produced Plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; magnetic field; LITHOGRAPHY;
D O I：
10.1117/12.2217947
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Gigaphoton Inc. develops a high-power laser produced plasma extreme ultraviolet (LPP EUV) light source for high volume manufacturing which enables sub-10nm critical layer patterning for semiconductor device fabrication. A technology update of key components of a 100 W LPP-EUV light source is given in this paper. The key components efficiently produce a stable plasma and evacuate the tin debris from the EUV vessel with a magnetic debris mitigation system. The chosen technology guarantees therefore a high-power and long-life EUV light source system. Each component is described with updated data. The latest system performance results are also presented. They were obtained from our proto LPP-EUV light systems which support 100 W output power
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页数：9
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