100W EUV light source key component technology update for HVM

被引：8

作者：

Hori, Tsukasa ^{[1
]}

Kawasuji, Yasufumi ^{[1
]}

Tanaka, Hiroshi ^{[1
]}

Watanabe, Yukio ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Abe, Tamotsu ^{[1
]}

Okamoto, Takeshi ^{[1
]}

Kodama, Takeshi ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Yamazaki, Taku ^{[1
]}

Okazaki, Shinji ^{[1
]}

Saitou, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII | 2016年 / 9776卷

关键词：

EUV light source; EUV lithography; Laser Produced Plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; magnetic field; LITHOGRAPHY;

D O I：

10.1117/12.2217947

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Gigaphoton Inc. develops a high-power laser produced plasma extreme ultraviolet (LPP EUV) light source for high volume manufacturing which enables sub-10nm critical layer patterning for semiconductor device fabrication. A technology update of key components of a 100 W LPP-EUV light source is given in this paper. The key components efficiently produce a stable plasma and evacuate the tin debris from the EUV vessel with a magnetic debris mitigation system. The chosen technology guarantees therefore a high-power and long-life EUV light source system. Each component is described with updated data. The latest system performance results are also presented. They were obtained from our proto LPP-EUV light systems which support 100 W output power

引用

页数：9

共 43 条

[41] Key components development progress of high-power LPP-EUV light source with unique debris mitigation system using a magnetic field
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