Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source

被引：2
|
作者：
Yabu, Takayuki [1 ]
Kawasuji, Yasufumi [1 ]
Hori, Tsukasa [1 ]
Okamoto, Takeshi [1 ]
Tanaka, Hiroshi [1 ]
Miyao, Kenichi [1 ]
Ishii, Takuya [1 ]
Watanabe, Yukio [1 ]
Yanagida, Tatsuya [1 ]
Shiraishi, Yutaka [1 ]
Abe, Tamotsu [1 ]
Kodama, Takeshi [1 ]
Nakarai, Hiroaki [1 ]
Yamazaki, Taku [1 ]
Itou, Noritoshi [1 ]
Saito, Takashi [1 ]
Mizoguchi, Hakaru [1 ]
机构：
[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan
来源：
INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017 | 2017年 / 10450卷
关键词：
EUV light source; EUV lithography; Laser produced plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; CO2-LASER;
D O I：
10.1117/12.2280503
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Gigaphoton Inc. is developing a CO2-Sn-LPP EUV light source based on unique and original technologies including a high power CO(2)laser with 15 nanosecond pulse duration, a solid-state pre-pulse laser with 10 picosecond pulse duration, a highly stabilized droplet generator, a precise laser-droplet shooting control system and a debris mitigation system using a magnetic field. In this paper, an update of the development progress of our 250W CO2-Sn-LPP EUV light source and of the key components is presented.
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页数：12
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