Key components technology update of the 250W High Power LPP-EUV light source

被引：10

作者：

Yasufumi, Kawasuji ^{[1
]}

Nowak, Krzysztof M. ^{[1
]}

Hori, Tsukasa ^{[1
]}

Okamoto, Takeshi ^{[1
]}

Tanaka, Hiroshi ^{[1
]}

Watanabe, Yukio ^{[1
]}

Abe, Tamotsu ^{[1
]}

Kodama, Takeshi ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Yamazaki, Taku ^{[1
]}

Okazaki, Shinji ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII | 2017年 / 10143卷

关键词：

EUV light source; EUV lithography; Laser Produced Plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; CO2-LASER;

D O I：

10.1117/12.2257808

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

13.5nm wavelength, CO2-Sn-LPP EUV light source which is the most promising solution for the source capable of enabling high-volume-manufacturing of semiconductor devices with critical layers patterned with sub-10nm resolution. Our source incorporates unique and original technologies such as; high power short pulse CO2 laser, short wavelength solid-state pre-pulse laser, highly stabilized droplet generator, a laser-droplet shooting control system and debris mitigation technology utilizing a strong magnetic field. In this paper we present a technology update on the key components of our 250W CO2-Sn-LPP EUV light source.

引用

页数：11

共 50 条

[1] Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source
Ueno, Yoshifumi
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[2] Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source
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