Key Components Development Progress Updates of the 250W High Power LPP-EUV Light Source

被引：2

作者：

Yabu, Takayuki ^{[1
]}

Kawasuji, Yasufumi ^{[1
]}

Hori, Tsukasa ^{[1
]}

Okamoto, Takeshi ^{[1
]}

Tanaka, Hiroshi ^{[1
]}

Miyao, Kenichi ^{[1
]}

Ishii, Takuya ^{[1
]}

Watanabe, Yukio ^{[1
]}

Yanagida, Tatsuya ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Abe, Tamotsu ^{[1
]}

Kodama, Takeshi ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Yamazaki, Taku ^{[1
]}

Itou, Noritoshi ^{[1
]}

Saito, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2017 | 2017年 / 10450卷

关键词：

EUV light source; EUV lithography; Laser produced plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; CO2-LASER;

D O I：

10.1117/12.2280503

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Gigaphoton Inc. is developing a CO2-Sn-LPP EUV light source based on unique and original technologies including a high power CO(2)laser with 15 nanosecond pulse duration, a solid-state pre-pulse laser with 10 picosecond pulse duration, a highly stabilized droplet generator, a precise laser-droplet shooting control system and a debris mitigation system using a magnetic field. In this paper, an update of the development progress of our 250W CO2-Sn-LPP EUV light source and of the key components is presented.

引用

页数：12

共 34 条

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[23] High Power LPP-EUV Source with Long Collector Mirror Lifetime for High Volume Semiconductor Manufacturing
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[24] High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor High Volume Manufacturing
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[25] Challenge of >300W High Power LPP-EUV Source with Long Collector Mirror Lifetime for Semiconductor HVM
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[27] Development progress of Sn-LPP EUV light source for inspection systems
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[28] Challenge of >300W High Power LPP-EUV Source with Long Collector Mirror Lifetime-III for Semiconductor HVM
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[29] Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source
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[30] LPP EUV light source employing high power CO2 laser
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