100W EUV light source key component technology update for HVM

被引：8

作者：

Hori, Tsukasa ^{[1
]}

Kawasuji, Yasufumi ^{[1
]}

Tanaka, Hiroshi ^{[1
]}

Watanabe, Yukio ^{[1
]}

Shiraishi, Yutaka ^{[1
]}

Abe, Tamotsu ^{[1
]}

Okamoto, Takeshi ^{[1
]}

Kodama, Takeshi ^{[1
]}

Nakarai, Hiroaki ^{[1
]}

Yamazaki, Taku ^{[1
]}

Okazaki, Shinji ^{[1
]}

Saitou, Takashi ^{[1
]}

Mizoguchi, Hakaru ^{[1
]}

机构：

[1] Gigaphoton Inc, 3-25-1 Shinomiya, Hiratsuka, Kanagawa 2548555, Japan

来源：

EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VII | 2016年 / 9776卷

关键词：

EUV light source; EUV lithography; Laser Produced Plasma; Tin; CO2; laser; Droplet generator; Collector mirror; Debris mitigation; magnetic field; LITHOGRAPHY;

D O I：

10.1117/12.2217947

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Gigaphoton Inc. develops a high-power laser produced plasma extreme ultraviolet (LPP EUV) light source for high volume manufacturing which enables sub-10nm critical layer patterning for semiconductor device fabrication. A technology update of key components of a 100 W LPP-EUV light source is given in this paper. The key components efficiently produce a stable plasma and evacuate the tin debris from the EUV vessel with a magnetic debris mitigation system. The chosen technology guarantees therefore a high-power and long-life EUV light source system. Each component is described with updated data. The latest system performance results are also presented. They were obtained from our proto LPP-EUV light systems which support 100 W output power

引用

页数：9

共 43 条

[1] Key components technology update of 100W HVM EUV source
Yamazaki, Taku
Mizoguchi, Hakaru
Nakarai, Hiroaki
Abe, Tamotsu
Kawasuji, Yasufumi
Okamoto, Takeshi
Tanaka, Hiroshi
Watanabe, Yukio
Hori, Tsukasa
Kodama, Takeshi
Shiraishi, Yutaka
Okazaki, Shinji
Saitou, Takashi
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VI, 2015, 9422
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Mizoguchi, Hakaru
Abe, Tamotsu
Watanabe, Yukio
Ishihara, Takanobu
Ohta, Takeshi
Hori, Tsukasa
Yanagida, Tatsuya
Nagano, Hitoshi
Yabu, Takayuki
Nagai, Shinji
Soumagne, Georg
Kurosu, Akihiko
Nowak, Krzysztof M.
Suganuma, Takashi
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Kakizaki, Kouji
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Nakarai, Hiroaki
Fujimoto, Junichi
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY II, 2011, 7969
[3] Performance of over 100 W HVM LPP-EUV Light Source
Okazaki, S.
Nakarai, H.
Abe, T.
Nowak, K. M.
Kawasuji, Y.
Tanaka, H.
Watanabe, Y.
Hori, T.
Kodama, T.
Shiraishi, Y.
Yanagida, T.
Soumagrne, G.
Yamada, T.
Yamazaki, T.
Saitou, T.
Mizoguchi, H.
X-RAY LASERS 2016, 2018, 202 : 341 - 349
[4] Performance of 100-W HVM LPP-EUV source
Mizoguchi, Hakaru
Nakarai, Hiroaki
Abe, Tamotsu
Nowak, Krzysztof M.
Kawasuji, Yasufumi
Tanaka, Hiroshi
Watanabe, Yukio
Hori, Tsukasa
Kodama, Takeshi
Shiraishi, Yutaka
Yanagida, Tatsuya
Soumagne, Georg
Yamada, Tsuyoshi
Yamazaki, Taku
Okazaki, Shinji
Saitou, Takashi
ADVANCED OPTICAL TECHNOLOGIES, 2015, 4 (04) : 297 - 309
[5] EUV players hit 100W output with LPP source
不详
SOLID STATE TECHNOLOGY, 2010, 53 (06) : 12 - 13
[6] DEVELOPMENT OF 250W EUV LIGHT SOURCE FOR HVM LITHOGRAPHY
Yamazaki, Taku
Nakarai, Hiroaki
Abe, Tamotsu
Nowak, Krzysztof M.
Kawasuji, Yasufumi
Okamoto, Takeshi
Tanaka, Hiroshi
Watanabe, Yukio
Hori, Tsukasa
Kodama, Takeshi
Yamagida, Tatsuya
Shiraishi, Yutaka
Saitou, Takashi
Mizoguchi, Hakaru
2017 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC 2017), 2017,
[7] DEVELOPMENT OF 250W EUV LIGHT SOURCE FOR HVM LITHOGRAPHY
Mizoguchi, Hakaru
Nakarcti, Hiroctki
Abe, Tamotsu
Nowak, Krzysztol M.
Kawasuji, Yasufunti
Tanaka, Hiroshi
Watanabe, Yukio
Hort, Tsukasa
Kodama, Takeshi
Shiraishi, Yutaka
Yanagida, Tatsitya
Yamada, Tsuyoshi
Yamazaki, Tiat
Okazaki, Shinji
Saitou, Takashi
HIGH-POWER LASER MATERIALS PROCESSING: APPLICATIONS, DIAGNOSTICS, AND SYSTEMS VI, 2017, 10097
[8] DEVELOPMENT OF 250W EUV LIGHT SOURCE FOR HVM LITHOGRAPHY
Mizoguchi, Hakaru
Nakarai, Hiroaki
Abe, Tamotsu
Nowak, Krzysztof M.
Kawasuji, Yasufumi
Tanaka, Hiroshi
Watanabe, Yukio
Hori, Tsukasa
Kodama, Takeshi
Shiraishi, Yutaka
Yanagida, Tatsuya
Yamada, Tsuyoshi
Yamazaki, Taku
Okazaki, Shinji
Saitou, Takashi
2016 CHINA SEMICONDUCTOR TECHNOLOGY INTERNATIONAL CONFERENCE (CSTIC), 2016,
[9] Key components technology update of the 250W High Power LPP-EUV light source
Yasufumi, Kawasuji
Nowak, Krzysztof M.
Hori, Tsukasa
Okamoto, Takeshi
Tanaka, Hiroshi
Watanabe, Yukio
Abe, Tamotsu
Kodama, Takeshi
Shiraishi, Yutaka
Nakarai, Hiroaki
Yamazaki, Taku
Okazaki, Shinji
Saito, Takashi
Mizoguchi, Hakaru
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY VIII, 2017, 10143
[10] Update of EUV Source Development Status for HVM Lithography
Mizoguchi, Hakaru
Nowak, Krzysztof M.
Nakarai, Hiroaki
Abe, Tamotsu
Ohta, Takeshi
Kawasuji, Yasufumi
Tanaka, Hiroshi
Watanabe, Yukio
Hori, Tsukasa
Kodama, Takeshi
Shiraishi, Yutaka
Yanagida, Tatsuya
Yamada, Tsuyoshi
Yamazaki, Taku
Okazaki, Shinji
Saitou, Takashi
JOURNAL OF LASER MICRO NANOENGINEERING, 2016, 11 (02): : 276 - 284

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