High-Speed Pseudo-CMOS Circuits Using Bulk Accumulation a-IGZO TFTs

被引:57
|
作者
Chen, Yuanfeng [1 ]
Geng, Di [1 ]
Mativenga, Mallory [1 ]
Nam, Hyoungsik [1 ]
Jang, Jin [1 ]
机构
[1] Kyung Hee Univ, Dept Informat Display, Adv Display Res Ctr, Seoul 130701, South Korea
关键词
a-IGZO TFTs; bulk accumulation; pseudo-CMOS; ring oscillator; THIN-FILM TRANSISTORS; GATE OFFSET STRUCTURE; ILLUMINATION; INSTABILITY;
D O I
10.1109/LED.2014.2379700
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We propose a way to achieve high-speed circuits with dual-gate (DG) bulk-accumulation back-channel-etched (BCE) amorphous indium-gallium-zinc-oxide (a-IGZO) thin-film transistors (TFTs) using the pseudo-CMOS structure. The DG BCE a-IGZO TFTs exhibit field-effect mobility (mu(FE)), threshold voltage (V-th), and subthreshold swing of 30 +/- 3 cm(2)/Vs, 2 +/- 0.5 V, and 120 +/- 30 mV/decade, respectively. For input voltage (V-DD) of 20 V, seven-stage pseudo-CMOS ring oscillators implemented with the BCE bulk-accumulation a-IGZO TFTs show oscillation frequency of 6.51 MHz, which corresponds to a propagation delay time of 11 ns/stage and is faster than the 17 ns/stage delay of the fastest single-gate-driven ratioed coplanar a-IGZO TFT circuits.
引用
收藏
页码:153 / 155
页数:3
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