Investigation of Switching Time in GaN/AlN Resonant Tunneling Diodes by Experiments and P-SPICE Models

被引:14
|
作者
Zhang, W. -D. [1 ,2 ]
Growden, T. A. [3 ,4 ]
Storm, D. F. [5 ]
Meyer, D. J. [5 ]
Berger, P. R. [3 ]
Brown, E. R. [1 ,2 ]
机构
[1] Wright State Univ, Dept Phys, Dayton, OH 45435 USA
[2] Wright State Univ, Dept Elect Engn, Dayton, OH 45435 USA
[3] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[4] Naval Res Lab, Washington, DC 20375 USA
[5] US Naval Res Lab, Washington, DC 20375 USA
基金
美国国家科学基金会;
关键词
GaN/AlN; heterostructure; measurement; modeling; P-SPICE; resonant tunneling diode (RTD); switching time;
D O I
10.1109/TED.2019.2955360
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The experimental and simulated switching behavior across the negative differential resistance (NDR) region ofGaN/AlN double-barrier resonant tunneling diodes (RTDs) is presented. The shortest 10%-90% experimental switching time was 55 ps. The experimental results are also studied with P-SPICE circuit models, which show that the relatively low peak-to-valley current ratio (1.5), relatively high specific contact resistance (>= 1 x 10(-6) cm(2)), and relatively large specific capacitance limit the switching time.
引用
收藏
页码:75 / 79
页数:5
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