Three-state dynamic random-access memory (DRAM)

被引:0
|
作者
Karmakar, Supriya [1 ]
机构
[1] Farmingdale State Coll, Elect & Comp Engn Technol, Farmingdale, NY 11735 USA
关键词
DRAM chips; field effect transistors; elemental semiconductors; silicon; quantum dots; integrated circuits; three-value DRAM cell; dynamic random-access memory cell; quantum dot gate field effect transistor; silicon process; Si; RESONANT-TUNNELING TRANSISTOR; FIELD-EFFECT TRANSISTOR; QUANTUM; SILICON; DESIGN; MODEL;
D O I
10.1049/iet-cds.2019.0117
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This work shows the design of three-valued dynamic random-access memory (DRAM) cell using quantum dot gate field effect transistor. DRAM is very popular for increasing device integration in integrated circuits. Storing multiple numbers of bits in a single DRAM cell increases the device integration further. The process technology is compatible with the conventional silicon process. The various write and read operations of the three-value DRAM cell are also discussed in this work.
引用
收藏
页码:176 / 181
页数:6
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