Ion implantation for micromaterial fabrication - fabrication and material properties

We used ion-implantation followed by etching to fabricate micromachine components from bulk silicon. The size of the ion-modified region was sufficiently small to make micro devices (e.g., devices with submieron dimensions). Ion implantation/etching techniques have the advantages of high controllability, high selectivity, and non-thermal processing, For 1x10(17) cm(2) gold ions implanted into silicon, micro cantilever beams were fabricated with a Young's modulus ranged from 13-8.5 Gpa. This micromachining technique is simple and effective to increasing a variety of micromaterial properties.