Low turn-on voltage GaAs heterojunction bipolar transistors with a pseudomorphic GaAsSb base

被引:22
|
作者
Oka, T [1 ]
Mishima, T [1 ]
Kudo, M [1 ]
机构
[1] Hitachi Ltd, Cent Res Lab, Tokyo 1858601, Japan
关键词
D O I
10.1063/1.1343853
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have developed GaAs heterojunction bipolar transistors (HBTs) with low turn-on voltage by using pseudomorphic GaAsSb as the base layer. The turn-on voltage of GaAs/GaAs0.91Sb0.09 HBT is 0.10 V lower than that of InGaP/GaAs HBT. The lower turn-on voltage is attributed to the smaller band gap of the GaAsSb base layer, indicating that GaAsSb is useful material for reducing turn-on voltage of GaAs HBTs. The current gain of 20 is obtained for GaAs/GaAs0.91Sb0.09 HBT, which is larger than those of previously reported GaAs/GaAsSb HBTs owing to the pseudomorphic, fully strained GaAsSb with no misfit dislocations. The knee voltage of 0.47 V is attained at the collector current density of 5x10(4) A/cm(2). These results indicate that GaAs/GaAsSb HBTs have a great potential for reducing operating voltage and power dissipation. (C) 2001 American Institute of Physics.
引用
收藏
页码:483 / 485
页数:3
相关论文
共 50 条
  • [21] Current Gain and Offset Voltage in an InGaP/GaAsSb/GaAs Double Heterojunction Bipolar Transistor
    Lin, Yu-Shyan
    Ng, Shao-Bin
    Yu, Wen-Fu
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2012, 59 (12) : 3339 - 3343
  • [22] Thermal stability of current gain in InGaP/GaAsSb/GaAs double-heterojunction bipolar transistors
    Yan, BP
    Hsu, CC
    Wang, XQ
    Yang, ES
    APPLIED PHYSICS LETTERS, 2004, 85 (19) : 4505 - 4507
  • [23] USE OF PSEUDOMORPHIC GAINAS IN HETEROJUNCTION BIPOLAR-TRANSISTORS
    ENQUIST, PM
    RAMBERG, LP
    NAJJAR, FE
    SCHAFF, WJ
    KAVANAGH, KL
    WICKS, GW
    EASTMAN, LF
    JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) : 378 - 382
  • [24] GAAS GAASSB BASED HETEROJUNCTION BIPOLAR-TRANSISTOR
    KHAMSEHPOUR, B
    SINGER, KE
    ELECTRONICS LETTERS, 1990, 26 (14) : 965 - 967
  • [25] Low-Turn-on-Voltage Heterojunction Bipolar Transistors with a C-Doped InGaAsSb Base Grown by Metalorganic Chemical Vapor Deposition
    Hoshi, Takuya
    Sugiyama, Hiroki
    Yokoyama, Haruki
    Kurishima, Kenji
    Ida, Minoru
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (04)
  • [26] Characterization of InGaP/GaAs heterojunction bipolar transistors with a heavily doped base
    Oka, T
    Ouchi, K
    Mochizuki, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (9A): : 5221 - 5226
  • [27] Changes in collector and base currents for AlGaAs/GaAs heterojunction bipolar transistors
    Iizuka, Norio
    Sugiyama, Tohru
    Obara, Masao
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (6 A): : 3377 - 3382
  • [28] Characterization of InGaP/GaAs heterojunction bipolar transistors with a heavily doped base
    Oka, T., 1600, Japan Society of Applied Physics (40):
  • [29] (GAAL)AS/GAAS HETEROJUNCTION BIPOLAR-TRANSISTORS WITH GRADED COMPOSITION IN THE BASE
    MILLER, DL
    ASBECK, PM
    ANDERSON, RJ
    EISEN, FH
    ELECTRONICS LETTERS, 1983, 19 (10) : 367 - 368
  • [30] VOLTAGE COMPARATORS IMPLEMENTED WITH GAAS/(GAAL)AS HETEROJUNCTION BIPOLAR-TRANSISTORS
    WANG, KC
    ASBECK, PM
    MILLER, DL
    EISEN, FH
    ELECTRONICS LETTERS, 1985, 21 (18) : 807 - 808