Effect of indium droplets on growth of InGaN film by molecular beam epitaxy

被引:12
|
作者
Zheng, Xiantong [1 ]
Liang, Hongwei [1 ]
Wang, Ping [2 ]
Sun, Xiaoxiao [2 ]
Chen, Zhaoying [2 ]
Wang, Tao [2 ]
Sheng, Bowen [2 ]
Wang, Yixin [2 ]
Chen, Ling [2 ]
Wang, Ding [2 ]
Rong, Xin [2 ]
Li, Mo [4 ]
Zhang, Jian [4 ]
Wang, Xinqiang [2 ,3 ]
机构
[1] Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China
[2] Peking Univ, Sch Phys, State Key Lab Artificial Microstruct & Mesoscop P, Beijing 100871, Peoples R China
[3] Collaborat Innovat Ctr Quantum Matter, Beijing, Peoples R China
[4] CAEP, Microsyst & Terahertz Res Ctr, 596 Yinhe Rd, Chengdu 610200, Sichuan, Peoples R China
关键词
In droplet; InGaN; MBE; QUANTUM-WELLS;
D O I
10.1016/j.spmi.2017.11.053
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Effect of indium (In) droplets on InGaN thin films grown by molecular beam epitaxy (MBE) has been investigated. The surface of InGaN covered by In droplets shows a smoother topography than that without droplets, indicating that the presence of In droplets is beneficial to the two dimensional growth. Beneath the In droplets, many ring-like structures are observed. The arrangement of these "ring" shows the movement of the In droplets during the InGaN growth. A qualitative growth model is proposed to explain the evolution of the InGaN surface morphology in In-droplet-induced-epitaxy process, giving an explanation that a local vapor-liquid-solid (VLS) system is preferentially formed at the edge of the droplets, leading to a high growth rate. Furthermore, the energy dispersive Xray spectroscopy results reveal that the relatively higher In/Ga flux ratio in the region covered by the In droplet results in a locally higher In content. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:650 / 656
页数:7
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