In situ x-ray photoelectron spectroscopy for electrochemical reactions in ordinary solvents

被引：80
|
作者：
Masuda, Takuya [1 ,2 ]
Yoshikawa, Hideki [3 ]
Noguchi, Hidenori [1 ,2 ,4 ,5 ]
Kawasaki, Tadahiro [6 ]
Kobata, Masaaki [3 ]
Kobayashi, Keisuke [3 ]
Uosaki, Kohei [1 ,4 ,5 ]
机构：
[1] Natl Inst Mat Sci NIMS, Global Res Ctr Environm & Energy Based Nanomat Sc, Tsukuba, Ibaraki 3050044, Japan
[2] Japan Sci & Technol Agcy JST, PRESTO, Kawaguchi, Saitama 3330012, Japan
[3] Natl Inst Mat Sci NIMS, Synchrotron Xray Stn SPring 8, Sayo, Hyogo 6795148, Japan
[4] Hokkaido Univ, Grad Sch Chem Sci & Engn, Sapporo, Hokkaido 0600810, Japan
[5] Natl Inst Mat Sci NIMS, Int Ctr Mat Nanoarchitecton WPI MANA, Tsukuba, Ibaraki 3050044, Japan
[6] Nagoya Univ, Grad Sch Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
来源：
APPLIED PHYSICS LETTERS | 2013年 / 103卷 / 11期
关键词：
IONIC LIQUID; WATER; INTERFACE; OXIDATION; VALENCE; STATE; XPS;
D O I：
10.1063/1.4821180
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
In situ electrochemical X-ray photoelectron spectroscopy (XPS) apparatus, which allows XPS at solid/liquid interfaces under potential control, was constructed utilizing a microcell with an ultra-thin Si membrane, which separates vacuum and a solution. Hard X-rays from a synchrotron source penetrate into the Si membrane surface exposed to the solution. Electrons emitted at the Si/solution interface can pass through the membrane and be analyzed by an analyzer placed in vacuum. Its operation was demonstrated for potential-induced Si oxide growth in water. Effect of potential and time on the thickness of Si and Si oxide layers was quantitatively determined at sub-nanometer resolution. (C) 2013 AIP Publishing LLC.
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页数：4
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