Performance of n-Type InSb and InAs Nanowire Field-Effect Transistors

被引:41
|
作者
Khayer, M. Abul [1 ]
Lake, Roger K. [1 ]
机构
[1] Univ Calif Riverside, Dept Elect Engn, Riverside, CA 92521 USA
关键词
Bandstructure; effective mass; InAs nanowire field-effect transistors (NWFETs); InSb NWFETs; k.p method; NWs;
D O I
10.1109/TED.2008.2005173
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electronic structure of highly scaled InSb and InAs nanowire (NW) field-effect transistors (FETs) is calculated with an eight-band k.p model. Cross sections of 4 nm or less result in bandgaps of 0.8 eV or more. For these cross sections, all devices are single moded and operate in the quantum capacitance limit. Analytical expressions for the transconductance, cutoff frequency, and gate delay time are presented and compared to numerical results. The dependence of the intrinsic cutoff frequency on drive current is weak, scaling as root ID with values in the 4-7 THz range that are good for RF applications. The gate delay times strongly depend on the drive current, scaling as I-D(-3/2) with values ranging from 25 to 132 fs which are competitive for digital applications.
引用
收藏
页码:2939 / 2945
页数:7
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