Synthesis of microcrystalline silicon thin films using a low-pressure microwave plasma

被引：0
|
作者：
Kikukawa, D [1 ]
Honma, K [1 ]
Hori, M [1 ]
Goto, T [1 ]
机构：
[1] Nagoya Univ, Grad Sch Engn, Dept Quantum Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS | 2001年
关键词：
D O I：
10.1109/IMNC.2001.984116
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：116 / 117
页数：2
相关论文
共 50 条
  • [41] CHARACTERIZATION OF LOW-PRESSURE CHEMICALLY VAPOUR-DEPOSITED THIN SILICON-NITRIDE FILMS
    POPOVA, LI
    ANTOV, BZ
    SHOPOV, AV
    SOTIROVA, MS
    BESHKOV, GD
    STEFANOV, EN
    THIN SOLID FILMS, 1984, 122 (02) : 153 - 163
  • [42] Low-pressure chemical vapor deposition of silicon-based thin films in a halogenlamp reactor
    Semmache, B
    Kallel, S
    El Omari, H
    Lemiti, M
    Laugier, A
    CANADIAN JOURNAL OF PHYSICS, 1999, 77 (09) : 737 - 743
  • [43] Plasma parameters for fast deposition of highly crystallized microcrystalline silicon films using high-density microwave plasma
    Jia, Haijun
    Saha, Jhantu K.
    Shirai, Hajime
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1600, 45 (2 A): : 666 - 673
  • [44] Plasma parameters for fast deposition of highly crystallized microcrystalline silicon films using high-density microwave plasma
    Jia, HJ
    Saha, JK
    Shirai, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (2A): : 666 - 673
  • [45] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF LOW INSITU PHOSPHORUS DOPED SILICON THIN-FILMS
    SARRET, M
    LIBA, A
    BONNAUD, O
    APPLIED PHYSICS LETTERS, 1991, 59 (12) : 1438 - 1439
  • [46] Low-pressure microwave plasma sterilization of polyethylene terephthalate bottles
    Deilmann, Michael
    Halfmann, Helmut
    Bibinov, Nikita
    Wunderlich, Joachim
    Awakowicz, Peter
    JOURNAL OF FOOD PROTECTION, 2008, 71 (10) : 2119 - 2123
  • [47] The growth of microcrystalline silicon oxide thin films studied by in situ plasma diagnostics
    Kirner, S.
    Gabriel, O.
    Stannowski, B.
    Rech, B.
    Schlatmann, R.
    APPLIED PHYSICS LETTERS, 2013, 102 (05)
  • [48] Low-pressure Preheating Combustion Synthesis of Silicon Nitride
    Zhang, Ke
    Bai, Ling
    Shen, Weiping
    Ge, Changchun
    ADVANCED MATERIALS AND PROCESSING, 2007, 26-28 : 441 - +
  • [49] Disilane as a growth rate catalyst of plasma deposited microcrystalline silicon thin films
    Dimitrakellis, P.
    Kalampounias, A. G.
    Spiliopoulos, N.
    Amanatides, E.
    Mataras, D.
    Lahootun, V.
    Coeuret, F.
    Madec, A.
    AIP ADVANCES, 2016, 6 (07):
  • [50] Structurization of submonolayer carbon coatings deposited in a low-pressure microwave plasma on single-crystal silicon
    V. Ya. Shanygin
    R. K. Yafarov
    Semiconductors, 2011, 45 : 1483 - 1488
12345