Synthesis of microcrystalline silicon thin films using a low-pressure microwave plasma

被引：0
|
作者：
Kikukawa, D [1 ]
Honma, K [1 ]
Hori, M [1 ]
Goto, T [1 ]
机构：
[1] Nagoya Univ, Grad Sch Engn, Dept Quantum Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS | 2001年
关键词：
D O I：
10.1109/IMNC.2001.984116
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：116 / 117
页数：2
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