Raman and electrical characterization of n-InP implanted by 630-keV nitrogen

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作者
Tiginyanu, IM [1 ]
Miao, J [1 ]
Hartnagel, HL [1 ]
Ruck, D [1 ]
Tinschert, K [1 ]
Ursaki, VV [1 ]
Ichizli, VM [1 ]
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[1] TH DARMSTADT,INST HOCHFREQUENZTECH,D-64283 DARMSTADT,GERMANY
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:598 / 601
页数:4
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