InN thin films deposited on flexible substrates by reactive RF-magnetron sputtering

被引：0
|
作者：
Zoita, N. C. [1 ]
Besleaga, C. [1 ]
Braic, L. [1 ]
Mitran, T. [1 ]
Grigorescu, C. [1 ]
Nedelcu, L. [2 ]
机构：
[1] Natl Inst Optoelect, RO-077125 Bucharest, Romania
[2] Natl Inst Mat Phys, RO-077125 Bucharest, Romania
来源：
OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS | 2008年 / 2卷 / 11期
关键词：
Indium nitride; flexible substrate; RF-magnetron sputtering;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Indium nitride is an attractive semiconductor material for optoelectronic applications, high-speed electronics and solar cells. We report successful deposition of polycrystalline InN thin films onto kapton polyimide flexible substrates by reactive RF magnetron sputtering method. The optical, structural and morphological characterization data are presented.
引用
收藏
页码：719 / 720
页数：2
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