Ultrahigh 22 nm resolution EUV coherent diffraction imaging using a tabletop 13 nm high harmonic source

被引：0
|
作者：
Seaberg, Matthew D. [1 ]
Adams, Daniel E. [1 ]
Zhang, Bosheng [1 ]
Gardner, Dennis F. [1 ]
Murnane, Margaret M. [1 ]
Kapteyn, Henry C. [1 ]
机构：
[1] Univ Colorado, Dept Phys, Boulder, CO 80309 USA
来源：
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2 | 2012年 / 8324卷
关键词：
x-ray imaging; phase retrieval; harmonic generation; mask inspection; REFLECTION GEOMETRY; GENERATION; MICROSCOPY;
D O I：
10.1117/12.916524
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We implement coherent diffractive imaging (CDI) using a phase-matched high-harmonic generation (HHG) source at 13 nm, demonstrating reconstructed images with a record 22 nm resolution for any tabletop, light-based microscope. We also demonstrate the first reflection-mode CDI using a compact extreme ultraviolet (EUV) source, achieving approximate to 100 nm resolution. A clear path towards even higher spatial resolution reflection-mode tabletop imaging using apertured-illumination schemes will be discussed.
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页数：7
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