Ultrahigh 22 nm resolution EUV coherent diffraction imaging using a tabletop 13 nm high harmonic source

被引：0

作者：

Seaberg, Matthew D. ^{[1
]}

Adams, Daniel E. ^{[1
]}

Zhang, Bosheng ^{[1
]}

Gardner, Dennis F. ^{[1
]}

Murnane, Margaret M. ^{[1
]}

Kapteyn, Henry C. ^{[1
]}

机构：

[1] Univ Colorado, Dept Phys, Boulder, CO 80309 USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2 | 2012年 / 8324卷

关键词：

x-ray imaging; phase retrieval; harmonic generation; mask inspection; REFLECTION GEOMETRY; GENERATION; MICROSCOPY;

D O I：

10.1117/12.916524

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We implement coherent diffractive imaging (CDI) using a phase-matched high-harmonic generation (HHG) source at 13 nm, demonstrating reconstructed images with a record 22 nm resolution for any tabletop, light-based microscope. We also demonstrate the first reflection-mode CDI using a compact extreme ultraviolet (EUV) source, achieving approximate to 100 nm resolution. A clear path towards even higher spatial resolution reflection-mode tabletop imaging using apertured-illumination schemes will be discussed.

引用

页数：7

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