Strained Interface Defects in Silicon Nanocrystals

被引:63
|
作者
Lee, Benjamin G. [1 ]
Hiller, Daniel [2 ]
Luo, Jun-Wei
Semonin, Octavi E. [3 ]
Beard, Matthew C.
Zacharias, Margit [2 ]
Stradins, Paul [1 ]
机构
[1] Natl Renewable Energy Lab, Natl Ctr Photovolta, Golden, CO 80401 USA
[2] Univ Freiburg, IMTEK Fac Engn, D-79110 Freiburg, Germany
[3] Univ Colorado, Dept Phys, Boulder, CO 80309 USA
关键词
silicon nanocrystals; interface defects; optical absorption; photothermal deflection spectroscopy; atomistic pseudopotential method; QUANTUM-DOTS; SI; PHOTOLUMINESCENCE; ABSORPTION;
D O I
10.1002/adfm.201200572
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The surface of silicon nanocrystals embedded in an oxide matrix can contain numerous interface defects. These defects strongly affect the nanocrystals photoluminescence efficiency and optical absorption. Dangling-bond defects are nearly eliminated by H2 passivation, thus decreasing absorption below the quantum-confined bandgap and enhancing PL efficiency by an order of magnitude. However, there remain numerous other defects seen in absorption by photothermal deflection spectroscopy; these defects cause non-radiative recombination that limits the PL efficiency to <15%. Using atomistic pseudopotential simulations, we attribute these defects to two specific types of distorted bonds: Si-Si and bridging Si-O-Si bonds between two Si atoms at the nanocrystal surface.
引用
收藏
页码:3223 / 3232
页数:10
相关论文
共 50 条
  • [41] CHARACTERIZATION OF INTERFACE DEFECTS IN OXYGEN-IMPLANTED SILICON FILMS
    MAYO, S
    LOWNEY, JR
    ROITMAN, P
    JOURNAL OF ELECTRONIC MATERIALS, 1993, 22 (02) : 207 - 214
  • [42] INTERFACE DEFECTS OF ULTRATHIN RAPID-THERMAL OXIDE ON SILICON
    STATHIS, JH
    BUCHANAN, DA
    QUINLAN, DL
    PARSONS, AH
    KOTECKI, DE
    APPLIED PHYSICS LETTERS, 1993, 62 (21) : 2682 - 2684
  • [43] Strained-silicon on silicon and strained-silicon on silicon-germanium on silicon by relaxed buffer bonding
    Isaacson, DM
    Taraschi, G
    Pitera, AJ
    Ariel, N
    Langdo, TA
    Fitzgerald, EA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (02) : G134 - G140
  • [44] Luminescence properties of strained GaN epilayers and spatial configurations of silicon impurity and related defects
    Gurskii, AL
    Lutsenko, EV
    Zelenkovskii, VM
    Bezjazychnaja, TV
    Pavlovskii, VN
    Zubialevich, VZ
    Schineller, B
    Schön, O
    Yablonskii, GP
    Heuken, M
    INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, PROCEEDINGS, 2002, : 425 - 429
  • [45] Structure of 6H silicon carbide/silicon dioxide interface trapping defects
    Meyer, DJ
    Bohna, NA
    Lenahan, PM
    Lelis, AJ
    APPLIED PHYSICS LETTERS, 2004, 84 (17) : 3406 - 3408
  • [46] MICROSTRUCTURE, ELECTRICAL-PROPERTIES AND PASSIVATION OF DEFECTS AT THE SILICON-SILICON-DIOXIDE INTERFACE
    CORREIA, A
    BALLUTAUD, D
    MAURICE, JL
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (03) : 898 - 902
  • [47] Mapping of Defects in Individual Silicon Nanocrystals Using Real-Space Spectroscopy
    Kislitsyn, Dmitry A.
    Kocevski, Vancho
    Mills, Jon M.
    Chiu, Sheng-Kuei
    Gervasi, Christian F.
    Taber, Benjamen N.
    Rosenfield, Ariel E.
    Eriksson, Olle
    Rusz, Jan
    Goforth, Andrea M.
    Nazin, George V.
    JOURNAL OF PHYSICAL CHEMISTRY LETTERS, 2016, 7 (06): : 1047 - 1054
  • [48] Emission from Strained Germanium Nanocrystals
    Rowell, N. L.
    Lockwood, D. J.
    NANOSCALE LUMINESCENT MATERIALS 5, 2018, 85 (03): : 41 - 52
  • [49] Pathways of bond topology transitions at the interface of silicon nanocrystals and amorphous silica matrix
    Yilmaz, D. E.
    Bulutay, C.
    Cagin, T.
    PHYSICAL REVIEW B, 2008, 77 (15)
  • [50] Strained Silicon Photonics
    Schriever, Clemens
    Bohley, Christian
    Schilling, Joerg
    Wehrspohn, Ralf B.
    MATERIALS, 2012, 5 (05): : 889 - 908