Strained Interface Defects in Silicon Nanocrystals

被引:63
|
作者
Lee, Benjamin G. [1 ]
Hiller, Daniel [2 ]
Luo, Jun-Wei
Semonin, Octavi E. [3 ]
Beard, Matthew C.
Zacharias, Margit [2 ]
Stradins, Paul [1 ]
机构
[1] Natl Renewable Energy Lab, Natl Ctr Photovolta, Golden, CO 80401 USA
[2] Univ Freiburg, IMTEK Fac Engn, D-79110 Freiburg, Germany
[3] Univ Colorado, Dept Phys, Boulder, CO 80309 USA
关键词
silicon nanocrystals; interface defects; optical absorption; photothermal deflection spectroscopy; atomistic pseudopotential method; QUANTUM-DOTS; SI; PHOTOLUMINESCENCE; ABSORPTION;
D O I
10.1002/adfm.201200572
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The surface of silicon nanocrystals embedded in an oxide matrix can contain numerous interface defects. These defects strongly affect the nanocrystals photoluminescence efficiency and optical absorption. Dangling-bond defects are nearly eliminated by H2 passivation, thus decreasing absorption below the quantum-confined bandgap and enhancing PL efficiency by an order of magnitude. However, there remain numerous other defects seen in absorption by photothermal deflection spectroscopy; these defects cause non-radiative recombination that limits the PL efficiency to <15%. Using atomistic pseudopotential simulations, we attribute these defects to two specific types of distorted bonds: Si-Si and bridging Si-O-Si bonds between two Si atoms at the nanocrystal surface.
引用
收藏
页码:3223 / 3232
页数:10
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