共 50 条
- [41] First results from AIMS beta tool for 157nm lithography OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 1648 - 1657
- [42] Testing of optical components for microlithography at 193nm and 157nm OPTICAL MICROLITHOGRAPHY XIV, PTS 1 AND 2, 2001, 4346 : 1340 - 1348
- [43] Interference patterning of gratings with a period of 150 nm at a wavelength of 157nm OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 1703 - 1713
- [44] A simple and practical 157nm and 193 nm coherent light source 2008 CONFERENCE ON LASERS AND ELECTRO-OPTICS & QUANTUM ELECTRONICS AND LASER SCIENCE CONFERENCE, VOLS 1-9, 2008, : 1859 - 1860
- [45] Investigation of hardmask/BARC materials for 157nm lithography MICROLITHOGRAPHIC TECHNIQUES IN INTEGRATED CIRCUIT FABRICATION II, 2000, 4226 : 93 - 106
- [46] Aberration determination in early 157nm exposure systems OPTICAL MICROLITHOGRAPHY XV, PTS 1 AND 2, 2002, 4691 : 1635 - 1643
- [47] Amine gradient resist process for 157nm lithography ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2, 2002, 4690 : 212 - 220
- [49] Novel materials for 157nm bilayer resist design ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XX, PTS 1 AND 2, 2003, 5039 : 627 - 632
- [50] Assessing the impact of intrinsic birefringence on 157nm lithography OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 : 99 - 103