Tailoring the shape of GaN/AlxGa1-xN nanostructures to extend their luminescence in the visible range

被引:29
|
作者
Brault, J. [1 ]
Huault, T. [1 ,2 ]
Natali, F. [1 ,2 ]
Damilano, B. [1 ]
Lefebvre, D. [1 ]
Leroux, M. [1 ]
Korytov, M. [1 ,3 ]
Massies, J. [1 ]
机构
[1] Ctr Rech Heteroepitaxie & Ses Applicat, CNRS, F-06560 Valbonne, France
[2] RIBER SA, F-95873 Bezons, France
[3] Univ Nice Sophia Antipolis, F-06103 Nice, France
关键词
aluminium compounds; atomic force microscopy; gallium compounds; III-V semiconductors; molecular beam epitaxial growth; nanostructured materials; photoluminescence; semiconductor growth; semiconductor heterojunctions; wide band gap semiconductors; GAN QUANTUM DOTS; MOLECULAR-BEAM EPITAXY; LIGHT-EMITTING DIODE; OPTICAL-PROPERTIES; GROWTH; RELAXATION; TRANSITION; SI(111); INAS; EFFICIENT;
D O I
10.1063/1.3075899
中图分类号
O59 [应用物理学];
学科分类号
摘要
We show that the shape of GaN nanostructures grown by molecular beam epitaxy on AlxGa1-xN (0001) surfaces, for x >= 0.4, can be controlled via the ammonia pressure. The nanostructures are obtained from a two dimensional to three dimensional transition of a GaN layer occurring upon a growth interruption. Atomic force microscopy measurements show that depending on the ammonia pressure during the growth interruption, dot or dash-shaped nanostructures can be obtained. Low temperature photoluminescence measurements reveal a large redshift in the emission energy of the quantum dashes, as compared to the quantum dots. By simply adjusting the GaN deposited thickness, it is shown that quantum dashes enable to strongly extend the emission range of GaN/Al0.5Ga0.5N nanostructures from the violet-blue (similar to 400-470 nm) to the green-orange range (similar to 500-600 nm).
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页数:7
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