High energy focused ion beam lithography using P-beam writing

被引：4
|
作者：
Glass, GA
Rout, B
Dymnikov, AD
Greco, RR
Kamal, M
Reinhardt, JR
Peeples, JA
机构：
[1] Univ Louisiana, Louisiana Accelarator Ctr, Lafayette, LA 70504 USA
[2] Univ Louisiana, Dept Chem Engn, Lafayette, LA 70504 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2005年 / 241卷 / 1-4期
关键词：
lithography; P-beam writing; nuclear microprobe; IRRADIATION;
D O I：
10.1016/j.nimb.2005.07.048
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The term "P-beam writing" is used to describe the technique of using focused high energy proton microbeams for micro or nanofabrication applications. The P-beam technique can be used to rapidly fabricate three-dimensional, high aspect ratio microstructures in a variety of materials without the use of masks and it is proving to be a versatile lithographic method. Recent developments in the application P-beam writing of microstructures at the Louisiana Accelerator Center are presented. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：397 / 401
页数：5
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