High energy focused ion beam lithography using P-beam writing

被引：4
|
作者：
Glass, GA
Rout, B
Dymnikov, AD
Greco, RR
Kamal, M
Reinhardt, JR
Peeples, JA
机构：
[1] Univ Louisiana, Louisiana Accelarator Ctr, Lafayette, LA 70504 USA
[2] Univ Louisiana, Dept Chem Engn, Lafayette, LA 70504 USA
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2005年 / 241卷 / 1-4期
关键词：
lithography; P-beam writing; nuclear microprobe; IRRADIATION;
D O I：
10.1016/j.nimb.2005.07.048
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
The term "P-beam writing" is used to describe the technique of using focused high energy proton microbeams for micro or nanofabrication applications. The P-beam technique can be used to rapidly fabricate three-dimensional, high aspect ratio microstructures in a variety of materials without the use of masks and it is proving to be a versatile lithographic method. Recent developments in the application P-beam writing of microstructures at the Louisiana Accelerator Center are presented. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：397 / 401
页数：5
相关论文
共 50 条
  • [31] Large-Scale Focused Helium Ion Beam Lithography
    LeFebvre, Jay C.
    Cybart, Shane A.
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2021, 31 (05)
  • [32] WRITING IMPLANTATION WITH A HIGH-CURRENT DENSITY FOCUSED ION-BEAM
    BISCHOFF, L
    HESSE, E
    PANKNIN, D
    SKORUPA, W
    TEICHERT, J
    MICROELECTRONIC ENGINEERING, 1994, 23 (1-4) : 115 - 118
  • [33] Focused ion beam lithography with transition metal oxide resists
    Koshida, Nobuyoshi, 1600, (28):
  • [34] DETECTION OF ALIGNMENT SIGNALS FOR FOCUSED ION-BEAM LITHOGRAPHY
    MORIMOTO, H
    SASAKI, Y
    ONODA, H
    KATO, T
    APPLIED PHYSICS LETTERS, 1985, 46 (09) : 898 - 900
  • [35] Multispecies focused ion beam lithography system and its applications
    Bauerdick, Sven
    Bruchhaus, Lars
    Mazarov, Paul
    Nadzeyka, Achim
    Jede, Ralf
    Fridmann, Joel
    Sanabia, Jason E.
    Gila, Brent
    Appleton, Bill R.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2013, 31 (06):
  • [36] Focused ion beam high resolution grayscale lithography for silicon-based nanostructures
    Erdmanis, M.
    Tittonen, I.
    APPLIED PHYSICS LETTERS, 2014, 104 (07)
  • [37] Direct-writing lithography using laser diode beam focused with single elliptical microlens
    Hasan, Md. Nazmul
    Haque, Muttahid-Ull
    Trisno, Jonathan
    Lee, Yung-Chun
    JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2015, 14 (04):
  • [38] Nano-photomask fabrication using focused ion beam direct writing
    Fang, F. Z.
    Xu, Z. W.
    Hu, X. T.
    Wang, C. T.
    Luo, X. G.
    Fu, Y. Q.
    CIRP ANNALS-MANUFACTURING TECHNOLOGY, 2010, 59 (01) : 543 - 546
  • [39] SUPER LOW-NOISE HEMT USING FOCUSED ION-BEAM LITHOGRAPHY
    NAGAHAMA, K
    NAKANISHI, M
    SASAKI, Y
    HOSONO, K
    MORIMOTO, H
    KATOH, T
    HIRANO, R
    MUROTANI, T
    KAWAGISHI, A
    ELECTRONICS LETTERS, 1988, 24 (04) : 242 - 243
  • [40] Ion beam mixing by focused ion beam
    Barna, Arpad
    Kotis, Laszlo
    Labar, Janos L.
    Osvath, Zoltan
    Toth, Attila L.
    Menyhard, Miklos
    Zalar, Anton
    Panjan, Peter
    JOURNAL OF APPLIED PHYSICS, 2007, 102 (05)
12345