Lithography using focused high-energy proton beam for fabrication of high-aspect-ratio microstructures

被引：0
|
作者：
Nishikawa, H. [1 ]
Furuta, Y. [1 ]
Uchiya, N. [1 ]
Haga, J. [2 ]
Oikawa, M. [2 ]
Satoh, T. [2 ]
Ishii, Y. [2 ]
Kamiya, T. [2 ]
机构：
[1] Shibaura Inst Technol, Dept Elect Engn, Koto Ku, 3-7-5 Toyosu, Tokyo 1358548, Japan
[2] Japan Atom Energy Agcy, Takasaki Adv Radiat Res Inst, Takasaki, Gunma 3701292, Japan
来源：
MICROPROCESSES AND NANOTECHNOLOGY 2007, DIGEST OF PAPERS | 2007年
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：66 / +
页数：2
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