Submicron holes in copper thin film directly ablated using femtosecond pulsed laser

被引：9

作者：

Venkatakrishnan, K ^{[1
]}

Tan, B ^{[1
]}

Ngoi, BKA ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Precis Engn & Nanotechnol Ctr, Singapore 639798, Singapore

来源：

OPTICAL ENGINEERING | 2001年 / 40卷 / 12期

关键词：

laser ablation; femtosecond-pulsed laser;

D O I：

10.1117/1.1419024

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Submicron holes in copper thin film were ablated using femtosecond pulsed laser. The analysis was carried out using a chirped-pulse-amplification-based Ti:sapphire systems. The system produced pulses of 800 nm wavelength and minimum pulse width of 150 fs at a repetition rate of 1 kHz. The original pulse from the laser system was made to pass through a second harmonic generator resulting in frequency doubling, to achieve ultraviolet radiation range wavelength.

引用

页码：2892 / 2893

页数：2

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