Thermodynamic and experimental studies of β-Ga2O3 growth by metalorganic vapor phase epitaxy
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作者:
Goto, Ken
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Goto, Ken
[1
]
Ikenaga, Kazutada
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Taiyo Nippon Sanso Corp, Minato Ku, Tokyo 1080014, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Ikenaga, Kazutada
[1
,2
]
Tanaka, Nami
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tanaka, Nami
[1
]
Ishikawa, Masato
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Gas Phase Growth Ltd, Koganei, Tokyo 1840012, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Ishikawa, Masato
[3
]
Machida, Hideaki
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Gas Phase Growth Ltd, Koganei, Tokyo 1840012, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Machida, Hideaki
[3
]
Kumagai, Yoshinao
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Kumagai, Yoshinao
[1
,4
]
机构:
[1] Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
[2] Taiyo Nippon Sanso Corp, Minato Ku, Tokyo 1080014, Japan
[3] Gas Phase Growth Ltd, Koganei, Tokyo 1840012, Japan
[4] Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, Japan
Thermodynamic analysis and experimental demonstration of beta-Ga2O3 growth by metalorganic vapor phase epitaxy using triethylgallium (TEG) and oxygen (O-2) precursors were performed. Thermodynamic analysis revealed that the O-2 supplied is preferentially used for the combustion of hydrocarbons and H-2 derived from TEG. Therefore, the use of high growth temperatures and high input VI/III ratios is essential for the complete combustion of hydrocarbons and H-2, and beta-Ga2O3 growth. The use of an inert gas as the carrier gas was also determined as necessary to grow beta-Ga2O3 at high temperatures. Based on these results, a ((2) over bar 01) oriented smooth beta-Ga2O3 layer could be grown on a c-plane sapphire substrate at 900 degrees C with a growth rate of 1.4 mu m h(-1) at an input VI/III ratio of 100. The grown layer showed a clear optical bandgap of 4.84 eV, and impurity concentrations of hydrogen and carbon were below the background levels of the measurement system. (C) 2021 The Japan Society of Applied Physics
机构:
Natl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, JapanNatl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, Japan
Oshima, Yuichi
Villora, Encarnacion G.
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Natl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, JapanNatl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, Japan
Villora, Encarnacion G.
Matsushita, Yoshitaka
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Natl Inst Mat Sci, Mat Anal Stn, Tsukuba, Ibaraki 3050044, JapanNatl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, Japan
Matsushita, Yoshitaka
Yamamoto, Satoshi
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Natl Inst Mat Sci, Optoelect Mat Grp, Tsukuba, Ibaraki 3050044, JapanNatl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, Japan
Yamamoto, Satoshi
Shimamura, Kiyoshi
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Natl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, JapanNatl Inst Mat Sci, Opt Single Crystals Grp, Tsukuba, Ibaraki 3050044, Japan
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Sophia Univ, Dept Engn & Appl Sci, Chiyoda, Tokyo 1028554, JapanSophia Univ, Dept Engn & Appl Sci, Chiyoda, Tokyo 1028554, Japan
Togashi, Rie
Ishida, Haruka
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Sophia Univ, Dept Engn & Appl Sci, Chiyoda, Tokyo 1028554, JapanSophia Univ, Dept Engn & Appl Sci, Chiyoda, Tokyo 1028554, Japan
Ishida, Haruka
Goto, Ken
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, JapanSophia Univ, Dept Engn & Appl Sci, Chiyoda, Tokyo 1028554, Japan
Goto, Ken
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Higashiwaki, Masataka
Kumagai, Yoshinao
论文数: 0引用数: 0
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, JapanSophia Univ, Dept Engn & Appl Sci, Chiyoda, Tokyo 1028554, Japan
机构:
Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Goto, Ken
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Murakami, Hisashi
Kuramata, Akito
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Novel Crystal Technol Inc, Sayama, Saitama 3501328, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Kuramata, Akito
Yamakoshi, Shigenobu
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Novel Crystal Technol Inc, Sayama, Saitama 3501328, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Yamakoshi, Shigenobu
Higashiwaki, Masataka
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Nat Inst Informat & Commun Technol, Koganei, Tokyo 1848795, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Higashiwaki, Masataka
Kumagai, Yoshinao
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Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, JapanTokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
机构:
Minzu Univ China, Sch Sci, Beijing 100081, Peoples R ChinaMinzu Univ China, Sch Sci, Beijing 100081, Peoples R China
Zheng, Xueyi
Zheng, Jun
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Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R ChinaMinzu Univ China, Sch Sci, Beijing 100081, Peoples R China
Zheng, Jun
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He, Chen
Liu, Xiangquan
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Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R ChinaMinzu Univ China, Sch Sci, Beijing 100081, Peoples R China
Liu, Xiangquan
Zuo, Yuhua
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Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R ChinaMinzu Univ China, Sch Sci, Beijing 100081, Peoples R China
Zuo, Yuhua
Cheng, Buwen
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Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R ChinaMinzu Univ China, Sch Sci, Beijing 100081, Peoples R China
Cheng, Buwen
Li, Chuanbo
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Minzu Univ China, Sch Sci, Beijing 100081, Peoples R ChinaMinzu Univ China, Sch Sci, Beijing 100081, Peoples R China
机构:
Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing UniversityKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University
Xiangqian Xiu
Liying Zhang
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Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing UniversityKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University
Liying Zhang
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Yuewen Li
Zening Xiong
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Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing UniversityKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University
Zening Xiong
Rong Zhang
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Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing UniversityKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University
Rong Zhang
Youdou Zheng
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Key Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing UniversityKey Laboratory of Advanced Photonic and Electronic Materials, School of Electronic Science and Engineering, Nanjing University
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Korea Inst Ceram Engn & Technol, 15-5 Chungmugong Dong, Jinju Si 52851, Gyeongsangnam D, South Korea
Korea Univ, Dept Mat Sci & Engn, Seoul 02841, South KoreaKorea Inst Ceram Engn & Technol, 15-5 Chungmugong Dong, Jinju Si 52851, Gyeongsangnam D, South Korea
Son, Hoki
Jeon, Dae-Woo
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Korea Inst Ceram Engn & Technol, 15-5 Chungmugong Dong, Jinju Si 52851, Gyeongsangnam D, South KoreaKorea Inst Ceram Engn & Technol, 15-5 Chungmugong Dong, Jinju Si 52851, Gyeongsangnam D, South Korea