Thermodynamic and experimental studies of β-Ga2O3 growth by metalorganic vapor phase epitaxy

被引:22
|
作者
Goto, Ken [1 ]
Ikenaga, Kazutada [1 ,2 ]
Tanaka, Nami [1 ]
Ishikawa, Masato [3 ]
Machida, Hideaki [3 ]
Kumagai, Yoshinao [1 ,4 ]
机构
[1] Tokyo Univ Agr & Technol, Dept Appl Chem, Koganei, Tokyo 1848588, Japan
[2] Taiyo Nippon Sanso Corp, Minato Ku, Tokyo 1080014, Japan
[3] Gas Phase Growth Ltd, Koganei, Tokyo 1840012, Japan
[4] Tokyo Univ Agr & Technol, Inst Global Innovat Res, Koganei, Tokyo 1848588, Japan
基金
日本学术振兴会;
关键词
HOMOEPITAXIAL GROWTH; THIN-FILMS; LAYERS; MOCVD; MOVPE; SI;
D O I
10.35848/1347-4065/abec9d
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thermodynamic analysis and experimental demonstration of beta-Ga2O3 growth by metalorganic vapor phase epitaxy using triethylgallium (TEG) and oxygen (O-2) precursors were performed. Thermodynamic analysis revealed that the O-2 supplied is preferentially used for the combustion of hydrocarbons and H-2 derived from TEG. Therefore, the use of high growth temperatures and high input VI/III ratios is essential for the complete combustion of hydrocarbons and H-2, and beta-Ga2O3 growth. The use of an inert gas as the carrier gas was also determined as necessary to grow beta-Ga2O3 at high temperatures. Based on these results, a ((2) over bar 01) oriented smooth beta-Ga2O3 layer could be grown on a c-plane sapphire substrate at 900 degrees C with a growth rate of 1.4 mu m h(-1) at an input VI/III ratio of 100. The grown layer showed a clear optical bandgap of 4.84 eV, and impurity concentrations of hydrogen and carbon were below the background levels of the measurement system. (C) 2021 The Japan Society of Applied Physics
引用
收藏
页数:8
相关论文
共 50 条
  • [31] Delta-doped β-Ga2O3 thin films and β-(Al0.26Ga0.74)2O3/β-Ga2O3 heterostructures grown by metalorganic vapor-phase epitaxy
    Ranga, Praneeth
    Bhattacharyya, Arkka
    Rishinaramangalam, Ashwin
    Ooi, Yu Kee
    Scarpulla, Michael A.
    Feezell, Daniel
    Krishnamoorthy, Sriram
    APPLIED PHYSICS EXPRESS, 2020, 13 (04)
  • [32] Epitaxial lateral overgrowth of α-Ga2O3 by halide vapor phase epitaxy
    Oshima, Y.
    Kawara, K.
    Shinohe, T.
    Hitora, T.
    Kasu, M.
    Fujita, S.
    APL MATERIALS, 2019, 7 (02):
  • [33] Growth and characterization of metalorganic vapor-phase epitaxy-grown β-(AlxGa1-x)2O3/β-Ga2O3 heterostructure channels
    Ranga, Praneeth
    Bhattacharyya, Arkka
    Chmielewski, Adrian
    Roy, Saurav
    Sun, Rujun
    Scarpulla, Michael A.
    Alem, Nasim
    Krishnamoorthy, Sriram
    APPLIED PHYSICS EXPRESS, 2021, 14 (02)
  • [34] Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates
    Meng, Lingyu
    Bhuiyan, A. F. M. Anhar Uddin
    Feng, Zixuan
    Huang, Hsien-Lien
    Hwang, Jinwoo
    Zhao, Hongping
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2022, 40 (06):
  • [35] Selective area growth of β-Ga2O3 by HCl-based halide vapor phase epitaxy
    Oshima, Takayoshi
    Oshima, Yuichi
    APPLIED PHYSICS EXPRESS, 2022, 15 (07)
  • [36] Numerical Modelling for the Experimental Improvement of Growth Uniformity in a Halide Vapor Phase Epitaxy Reactor for Manufacturing β-Ga2O3 Layers
    Pozina, Galia
    Hsu, Chih-Wei
    Abrikossova, Natalia
    Hemmingsson, Carl
    CRYSTALS, 2022, 12 (12)
  • [37] Heteroepitaxial Growth of Thick α-Ga2O3 Films on Sapphire Substrates by Flow Modulation Epitaxy with Halide Vapor Phase Epitaxy
    Lee, Gieop
    Cha, An-Na
    Cho, Sea
    Chung, Jeong Soo
    Moon, Young-Boo
    Ha, Jun-Seok
    CRYSTAL GROWTH & DESIGN, 2023, 24 (01) : 205 - 213
  • [38] Heteroepitaxial Growth of Thick α-Ga2O3 Films on Sapphire Substrates by Flow Modulation Epitaxy with Halide Vapor Phase Epitaxy
    Lee, Gieop
    Cha, An-Na
    Cho, Sea
    Chung, Jeong Soo
    Moon, Young-Boo
    Ha, Jun-Seok
    Crystal Growth and Design, 2024, 24 (01): : 205 - 213
  • [39] Anisotropic vapor phase growth of Ga2O3 crystalline nanobelts
    Lan, YC
    Crimp, MA
    Zhang, JM
    JOURNAL OF CRYSTAL GROWTH, 2006, 290 (02) : 585 - 591
  • [40] Investigation of high speed β-Ga2O3 growth by solid-source trihalide vapor phase epitaxy
    Nitta, Kyohei
    Sasaki, Kohei
    Kuramata, Akito
    Murakami, Hisashi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SF)