Temperature dependence of electrical characteristics of Au/SiO2/n-GaAS (MOS) structures

被引:0
|
作者
Goekcen, M. [1 ]
Altuntas, H. [1 ]
Altindal, S. [1 ]
机构
[1] Gazi Univ, Fac Arts & Sci, Dept Phys, TR-06500 Ankara, Turkey
来源
OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS | 2008年 / 2卷 / 12期
关键词
Au/SiO2/n; -; GaAs; MOS structure; Capacitance-voltage characteristics;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Temperature dependence of capacitance-voltage (C-V) and conductance-voltage (G/w-V) characteristics of the Au/SiO2/n( MOS) structures were investigated by considering the both the interface states (N-ss) and series resistance (R-s) Both the values of capacitance and conductance generally increase with increasing temperature. These increase in G/w especially at high temperatures results from the existence of interface states at SiO2/n-GaAs interface. It is found the existence of R-s, the forward bias C-V curves exhibit an anamolous peak, and this peak positions shift toward region to inversion region with increasing temperature. Also the magnitude of peak increases with temperature. The values of R-s and Nss were calculated by using Nicollian and Goetzberger and Hill-Coleman respectively. The experimental C-V and G/w-V characteristics confirm that the R-s and N-ss of the MOS structure parameters that strongly influence the electrical characteristics of the Au/SiO2/n-GaAs structures especially at high temperatures.
引用
收藏
页码:838 / 841
页数:4
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