Atomic force microscopy investigation of the effects of annealing on amorphous carbon nitride films deposited by r.f. magnetron sputtering

被引：19
|
作者：
Prioli, R
Zanette, SI
Caride, AO
Lacerda, MM
Freire, FL
机构：
[1] Ctr Brasileiro Pesquisas Fis, BR-22290180 Rio De Janeiro, Brazil
[2] Pontificia Univ Catolica Rio de Janeiro, Dept Fis, BR-22452970 Rio De Janeiro, Brazil
来源：
DIAMOND AND RELATED MATERIALS | 1999年 / 8卷 / 06期
关键词：
annealing; atomic force microscopy; carbon nitride; tribology;
D O I：
10.1016/S0925-9635(98)00453-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Atomic force microscopy is used to study the effects of thermal annealing on the surface topography and the tribological properties of amorphous carbon nitride thin films deposited by r.f. magnetron sputtering. The results show that the surface roughness decreases with increasing annealing temperature. The friction coefficients at the interface between a Si3N4 tip and the amorphous carbon nitride films surface decrease with increasing smoothness of the surface. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：993 / 995
页数：3
相关论文
共 50 条
  • [31] Influence of vacuum annealing on properties of ZnO:Ga films prepared by r.f. magnetron sputtering
    Ma, J
    Yu, XH
    Ji, F
    Wang, YH
    Zhang, XJ
    Cheng, CF
    Ma, HL
    RARE METAL MATERIALS AND ENGINEERING, 2005, 34 (07) : 1166 - 1168
  • [32] Transparent conducting ZnO:Al films deposited on organic substrates deposited by r.f. magnetron-sputtering
    Yang, TL
    Zhang, DH
    Ma, J
    Ma, HL
    Chen, Y
    THIN SOLID FILMS, 1998, 326 (1-2) : 60 - 62
  • [33] Plasma diagnostic studies to the carbon nitride film deposition by reactive r.f. magnetron sputtering
    Kaltofen, R.
    Sebald, T.
    Weise, G.
    Thin Solid Films, 1996, 290-291 : 112 - 119
  • [34] Stability of amorphous alumina layers deposited on platinum films by r.f. magnetron sputtering in water solutions. A microscopic approach based on scanning electrochemical microscopy
    Battistel, Dario
    Bragato, Carlo
    Baldo, M. Antonietta
    Cattaruzza, Elti
    Daniele, Salvatore
    SURFACES AND INTERFACES, 2025, 60
  • [35] Study of ZnTe thin films deposited by r.f. sputtering
    Bellakhder, H
    Outzourhit, A
    Ameziane, EL
    THIN SOLID FILMS, 2001, 382 (1-2) : 30 - 33
  • [36] EELS and NEXAFS structural investigations on the effects of the nitrogen incorporation in a-CNx films deposited by r.f. magnetron sputtering
    Mubumbila, N
    Bouchet-Fabre, B
    Godon, C
    Marhic, C
    Angleraud, B
    Tessier, PY
    Minea, T
    DIAMOND AND RELATED MATERIALS, 2004, 13 (4-8) : 1433 - 1436
  • [37] Electrical and infrared characterization of thin SiO2 films deposited by r.f. magnetron sputtering
    Nedev, N.
    Manolov, E.
    Nesheva, D.
    Terrazas, J. M.
    Valdez, B.
    Curiel, M. A.
    Zlatev, R.
    JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2009, 11 (09): : 1300 - 1303
  • [38] Structure and properties of carbon nitride films deposited by magnetron sputtering
    Zheng, WT
    Ji, H
    Yu, WX
    Li, HB
    Jin, ZS
    Wang, YM
    Sundgren, JE
    MATERIALS CHEMISTRY AND PHYSICS, 1999, 60 (02) : 163 - 167
  • [39] Nanometric chromium nitride/chromium carbide multilayers by r.f. magnetron sputtering
    Romero, J
    Martínez, E
    Esteve, J
    Lousa, A
    SURFACE & COATINGS TECHNOLOGY, 2004, 180 : 335 - 340
  • [40] Study on structure and properties of ZnO:Ga films deposited on the organic substrate by r.f. magnetron sputtering
    Li, Sumin
    Zhao, Yutao
    Zhang, Zhao
    Taiyangneng Xuebao/Acta Energiae Solaris Sinica, 2007, 28 (11): : 1233 - 1238
12345