Numerical study of self-heating effects of MOSFETs fabricated on SOAN substrate

A two-dimensional numerical analysis is performed to investigate the self-heating effects of metal-oxide-silicon field-effect transistors (MOSFETs) fabricated in silicon-on-aluminum nitride (SOAN) substrate. The electrical characteristics and temperature distribution are simulated and compared to those of bulk and standard silicon-on-insulator (SOI) MOSFETs. The SOAN devices are shown to have good leakage and subhreshold characteristics. Furthermore, the channel temperature and negative differential resistance are reduced during high-temperature operation, suggesting that SOAN can mitigate the self-heating penalty effectively. Our study suggests that AlN is a suitable alternative to silicon dioxide as the buried dielectric in SOI, and expands the applications of SOI to high temperature.