Selective area growth of GaSb nano-templates on GaAs (001) using atomic hydrogen assisted molecular beam epitaxy

被引:0
|
作者
Desplanque, Ludovic [1 ,2 ]
Fahed, Maria [1 ,2 ]
Troadec, David [1 ,2 ]
Ruterana, Pierre [3 ]
Wallart, Xavier [1 ,2 ]
机构
[1] CNRS, IEMN, UMR 8520, F-75700 Paris, France
[2] Univ Lille, Lille, France
[3] UCBN, CEA, CNRS, ENSICAEN,CIMAP,UMR 6252, Caen, France
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页数:1
相关论文
共 50 条
  • [31] Initial stage of growth of GaN/GaAs(001) in plasma-assisted molecular beam epitaxy
    Yang, H
    Brandt, O
    Trampert, A
    Ploog, KH
    APPLIED SURFACE SCIENCE, 1996, 104 : 461 - 467
  • [32] Basic analysis of atomic-scale growth mechanisms for molecular beam epitaxy of GaAs using atomic hydrogen as a surfactant
    Okada, Y
    Harris, JS
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (03): : 1725 - 1728
  • [33] SELECTIVE GROWTH OF GAAS BY MOLECULAR-BEAM EPITAXY
    SUGAYA, T
    OKADA, Y
    KAWABE, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1992, 31 (6A): : L713 - L716
  • [34] SELECTIVE GROWTH OF GAAS BY MOLECULAR-BEAM EPITAXY
    HIYAMIZU, S
    FUJII, T
    NANBU, K
    SAKURAI, T
    HASHIMOTO, H
    RYUZAN, O
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) : C121 - C122
  • [35] Selective growth conditions of ZnSe/ZnS heterostructures on (001) GaAs with metalorganic molecular beam epitaxy
    Ueta, Akio
    Suemune, Ikuo
    Uesugi, Katsuhiro
    Arita, Munetaka
    Avramescu, Adrian
    Numai, Takahiro
    Machida, Hideaki
    Shimoyama, Norio
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1997, 36 (08): : 5044 - 5049
  • [36] Selective-area epitaxial growth of GaAs in deep dielectric windows using molecular beam epitaxy
    Loke, WK
    Yoon, SF
    Zheng, HQ
    JOURNAL OF CRYSTAL GROWTH, 2001, 222 (1-2) : 44 - 52
  • [37] Selective growth conditions of ZnSe/ZnS heterostructures on (001) GaAs with metalorganic molecular beam epitaxy
    Ueta, A
    Suemune, I
    Uesugi, K
    Arita, M
    Avramescu, A
    Numai, T
    Machida, H
    Shimoyama, N
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (08): : 5044 - 5049
  • [38] The improvement characteristics of homoepitaxial GaAs grown by atomic hydrogen-assisted molecular beam epitaxy
    Wang, HL
    Zhu, HJ
    Ning, D
    Wang, H
    Wang, XD
    Guo, ZS
    Feng, SL
    JOURNAL OF INFRARED AND MILLIMETER WAVES, 2000, 19 (03) : 191 - 193
  • [39] Improvement characteristics of homoepitaxial GaAs grown by atomic hydrogen-assisted molecular beam epitaxy
    Wang, Hailong
    Zhu, Haijun
    Ning, Dong
    Wang, Hui
    Wang, Xiaodong
    Guo, Zhongsheng
    Feng, Songlin
    Hongwai Yu Haomibo Xuebao/Journal of Infrared and Millimeter Waves, 2000, 19 (03): : 191 - 193
  • [40] Growth of InP on GaAs (001) by hydrogen-assisted low-temperature solid-source molecular beam epitaxy
    Postigo, P.A.
    Suárez, F.
    Sanz-Hervás, A.
    Sangrador, J.
    Fonstad, C.G.
    Journal of Applied Physics, 2008, 103 (01):