Cycling induced performance degradation of flash EEPROMs has been reported for V-B=0 and V-B<0 programming operation. Compared to V-B=0, V-B<0 programming shows lower interface degradation for identical cumulative charge fluence (for program) during repetitive program/erase cycling. Reduction in programming gate current has been found to be lower for V-B<0 operation under identical interface damage as the V-B=0 case. As a consequence, programming under V-B<0 condition has been found to cause lower degradation of programming time and programmed V-T due to cycling.
机构:
State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical TechnologyState Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Kun Wang
Ning Li
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State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical TechnologyState Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Ning Li
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机构:
Yanan Yang
Shaojie Ke
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State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical TechnologyState Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Shaojie Ke
Zhengping Zhang
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State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Beijing Advanced Innovation Center for Soft Matter Science and Engineering, Beijing University of Chemical TechnologyState Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Zhengping Zhang
Meiling Dou
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State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Beijing Advanced Innovation Center for Soft Matter Science and Engineering, Beijing University of Chemical TechnologyState Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Meiling Dou
Feng Wang
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State Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
Beijing Advanced Innovation Center for Soft Matter Science and Engineering, Beijing University of Chemical TechnologyState Key Laboratory of Chemical Resource Engineering, Beijing Key Laboratory of Electrochemical Process and Technology for Materials, Beijing University of Chemical Technology
机构:
Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Ji, Eunji
Kim, Min Jung
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Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Kim, Min Jung
Lee, Jong-Young
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Lee, Jong-Young
Sung, Dongchul
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Sejong Univ, Graphene Res Inst, Dept Phys, Seoul 05006, South Korea
Sejong Univ, GRI TPC Int Res Ctr, Seoul 05006, South Korea
Sungkyunkwan Univ, Dept Chem, Suwon 16419, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Sung, Dongchul
Kim, Namwon
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Seoul Natl Univ, Res Inst Adv Mat RIAM, Seoul 08826, South Korea
Texas State Univ, Ingram Sch Engn, San Marcos, TX 78666 USAYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Kim, Namwon
Park, Jin-Woo
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Yonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Park, Jin-Woo
Hong, Suklyun
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Sejong Univ, Graphene Res Inst, Dept Phys, Seoul 05006, South Korea
Sejong Univ, GRI TPC Int Res Ctr, Seoul 05006, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
Hong, Suklyun
Lee, Gwan-Hyoung
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Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 08826, South Korea
Seoul Natl Univ, Res Inst Adv Mat RIAM, Seoul 08826, South Korea
Seoul Natl Univ, Inst Engn Res, Seoul 08826, South Korea
Seoul Natl Univ, Inst Appl Phys, Seoul 08826, South KoreaYonsei Univ, Dept Mat Sci & Engn, Seoul 03722, South Korea
机构:
Ningbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences
College of Physics and Electronic Information,Tianjin Normal UniversityNingbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences
ZHANG Xue-qian
KE Pei-ling
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Ningbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of SciencesNingbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences
KE Pei-ling
WANG Ai-ying
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Ningbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of SciencesNingbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences
WANG Ai-ying
HUANG Mei-dong
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College of Physics and Electronic Information,Tianjin Normal UniversityNingbo Key Laboratory of Marine Protection Materials,Ningbo Institute of Materials Technology and Engineering,Chinese Academy of Sciences