Nanolithography Toolbox: Device design at the nanoscale

被引：0

作者：

Balram, K. C. ^{[1
,2
]}

Westly, D. A. ^{[1
]}

Davanco, M. ^{[1
]}

Grutter, K. E. ^{[1
]}

Li, Q. ^{[1
,2
]}

Michels, T. ^{[1
]}

Ray, C. H. ^{[1
]}

Yu, L. ^{[1
]}

Kasica, R. J. ^{[1
]}

Wallin, C. B. ^{[1
,2
]}

Gilbert, I. J. ^{[1
,2
]}

Bryce, Brian A. ^{[3
]}

Simelgor, G. ^{[4
]}

Topolancik, J. ^{[5
]}

Lobontiu, N. ^{[6
]}

Liu, Y. ^{[7
]}

Neuzil, P. ^{[8
,9
]}

Svatos, V. ^{[8
]}

Dill, K. A. ^{[1
]}

Bertrand, N. A. ^{[1
]}

Metzler, M. ^{[10
]}

Lopez, G. ^{[10
]}

Czaplewski, D. A. ^{[11
]}

Ocola, L. ^{[11
]}

Srinivasan, K. A. ^{[1
]}

Stavis, S. M. ^{[1
]}

Aksyuk, V. A. ^{[1
]}

Liddle, J. A. ^{[1
]}

Krylov, S. ^{[12
]}

Ilic, B. R. ^{[1
]}

机构：

[1] NIST, Ctr Nanoscale Sci & Technol, Gaithersburg, MD 20899 USA

[2] Univ Maryland, Maryland NanoCtr, College Pk, MD 20742 USA

[3] Harvey Mudd Coll, Claremont, CA 91711 USA

[4] Edico Genome, La Jolla, CA 92037 USA

[5] Roche Sequencing Solut, Pleasanton, CA 94588 USA

[6] Univ Alaska Anchorage, Mech Engn, Anchorage, AK 99508 USA

[7] Worcester Polytech Inst, Mech Engn, Worcester, MA 01609 USA

[8] Brno Univ Technol, Cent European Inst Technol, Tech 3058 10, CZ-61600 Brno, Czech Republic

[9] Northwestern Polytech Univ, Dept Microsyst, Xian, Shaanxi, Peoples R China

[10] Univ Penn, Quattrone Nanofabricat Facil, Philadelphia, PA 19104 USA

[11] Argonne Natl Lab, Ctr Nanoscale Mat, Lemont, IL 60439 USA

[12] Tel Aviv Univ, Sch Mech Engn, IL-69978 Tel Aviv, Israel

来源：

2017 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2017年

关键词：

LITHOGRAPHY; RESOLUTION; PLATFORM;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have developed a platform-independent software package for designing nanometer scaled device architectures. The Nanolithography Toolbox is applicable to a broad range of design tasks in the fabrication of microscale and nanoscale devices.

引用

页数：2

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