Negative ion density in inductively coupled chlorine plasmas

被引:49
|
作者
Hebner, GA
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1116/1.580040
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Laser photodetachment spectroscopy has been used to infer the density of chlorine negative ions in an inductively coupled chlorine plasma. Time dependent, excess electron density produced by photodetaching electrons from Cl- was detected by a microwave interferometer operating at 80 GHz. By focusing the microwave probe beam through the center of the discharge, negative ion density measurements could be performed in a small, 1.5 cm(3), volume. As the rf power into the plasma increased from 155 to 340 W at 20 mTorr, the Cl- density in the center of the bulk plasma increased from 3.4 to 5.2x10(11) cm(-3). As the pressure was increased from 15 to 50 mTorr at 240 W, the Cl- density increased from 3.5 to 5x10(11) cm(3). Over this parameter space, the negative ion density equaled the electron density to within a factor of 2. The negative ion radial distribution was relatively constant, with a 20% decrease in the center of the plasma for some operating conditions. When the surface of the bias electrode was changed from stainless steel to silicon, the electron density remained constant but the Cl- density decreased by a factor of 2 to 3. (C) 1996 American Vacuum Society.
引用
收藏
页码:2158 / 2162
页数:5
相关论文
共 50 条
  • [41] GENERATION AND APPLICATION OF HIGH DENSITY LOW-FREQUENCY INDUCTIVELY COUPLED PLASMAS
    Xu, Shuyan
    Ostrikov, Kostya
    [J]. STATISTICAL PHYSICS, HIGH ENERGY, CONDENSED MATTER AND MATHEMATICAL PHYSICS, 2008, : 548 - 548
  • [42] Experimental investigation of edge-to-center density ratio in inductively coupled plasmas
    Kim, Gun-Ho
    Lee, Hyo-Chang
    Chung, Chin-Wook
    [J]. PHYSICS OF PLASMAS, 2010, 17 (07)
  • [43] Inductively coupled reactive high-density plasmas designed for sputter deposition
    Miyake, S
    Setsuhara, Y
    Zhang, JQ
    Kamai, M
    Kyoh, B
    [J]. SURFACE & COATINGS TECHNOLOGY, 1997, 97 (1-3): : 768 - 772
  • [44] Real-time feedback control of plasma density in inductively coupled plasmas
    Chang, C.H.
    Leou, K.C.
    Lin, C.
    [J]. IEEE International Conference on Plasma Science, 2000,
  • [45] Ion energy distributions in inductively coupled plasmas having a biased boundary electrode
    Logue, Michael D.
    Shin, Hyungjoo
    Zhu, Weiye
    Xu, Lin
    Donnelly, Vincent M.
    Economou, Demetre J.
    Kushner, Mark J.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (06):
  • [46] Decreasing high ion energy during transition in pulsed inductively coupled plasmas
    Agarwal, Ankur
    Stout, Phillip J.
    Banna, Samer
    Rauf, Shahid
    Collins, Ken
    [J]. APPLIED PHYSICS LETTERS, 2012, 100 (04)
  • [47] Ion compositions and energies in inductively coupled plasmas containing SF6
    Goyette, AN
    Wang, YC
    Olthoff, JK
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (04): : 1294 - 1297
  • [48] Characterization of electron and negative ion densities in fluorocarbon containing inductively driven plasmas
    Hebner, GA
    Abraham, IC
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (10) : 4929 - 4937
  • [49] Factors influencing ion energy distributions in pulsed inductively coupled argon plasmas
    Chen, Zhiying
    Longo, Roberto C.
    Hummel, Michael
    Carruth, Megan
    Blakeney, Joel
    Ventzek, Peter
    Ranjan, Alok
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2020, 53 (33)
  • [50] SIMPLEX OPTIMIZATION OF INDUCTIVELY COUPLED PLASMAS
    EBDON, L
    CAVE, MR
    MOWTHORPE, DJ
    [J]. ANALYTICA CHIMICA ACTA, 1980, 115 (MAR) : 179 - 187