GENERATION AND APPLICATION OF HIGH DENSITY LOW-FREQUENCY INDUCTIVELY COUPLED PLASMAS

被引:0
|
作者
Xu, Shuyan [1 ,2 ]
Ostrikov, Kostya [2 ,3 ]
机构
[1] Nanyang Technol Univ, Plasma Sources & Applicat Ctr, NIE, Singapore, Singapore
[2] Nanyang Technol Univ, Inst Adv Studies, Singapore, Singapore
[3] Univ Sydney, Sch Phys, Plasma Nanosci, Sydney, NSW, Australia
关键词
D O I
10.1142/9789812794185_0083
中图分类号
O29 [应用数学];
学科分类号
070104 ;
摘要
引用
收藏
页码:548 / 548
页数:1
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