Negative ion density in inductively coupled chlorine plasmas

被引:49
|
作者
Hebner, GA
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1116/1.580040
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Laser photodetachment spectroscopy has been used to infer the density of chlorine negative ions in an inductively coupled chlorine plasma. Time dependent, excess electron density produced by photodetaching electrons from Cl- was detected by a microwave interferometer operating at 80 GHz. By focusing the microwave probe beam through the center of the discharge, negative ion density measurements could be performed in a small, 1.5 cm(3), volume. As the rf power into the plasma increased from 155 to 340 W at 20 mTorr, the Cl- density in the center of the bulk plasma increased from 3.4 to 5.2x10(11) cm(-3). As the pressure was increased from 15 to 50 mTorr at 240 W, the Cl- density increased from 3.5 to 5x10(11) cm(3). Over this parameter space, the negative ion density equaled the electron density to within a factor of 2. The negative ion radial distribution was relatively constant, with a 20% decrease in the center of the plasma for some operating conditions. When the surface of the bias electrode was changed from stainless steel to silicon, the electron density remained constant but the Cl- density decreased by a factor of 2 to 3. (C) 1996 American Vacuum Society.
引用
收藏
页码:2158 / 2162
页数:5
相关论文
共 50 条
  • [31] Diagnostics of inductively coupled chlorine plasmas:: Measurement of Cl2 and Cl number densities
    Malyshev, MV
    Donnelly, VM
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (11) : 6207 - 6215
  • [32] Dry etching of sapphire substrate for device separation in chlorine-based inductively coupled plasmas
    Jeong, CH
    Kim, DW
    Bae, JW
    Sung, YJ
    Kwak, JS
    Park, YJ
    Yeom, GY
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 93 (1-3): : 60 - 63
  • [33] Etching of iridium thin films in chlorine- and fluorine-based inductively coupled plasmas
    Borges, Juliano
    Yan, Hongwen
    Koty, Devi
    Rogalskyj, Sophia
    Gignac, Lynne
    Ocola, Leonidas
    Hopstaken, Marinus
    Molis, Steve
    Simon, Andrew
    Arnold, John
    Shearer, Jeffrey
    Bruce, Robert L.
    [J]. ADVANCED ETCH TECHNOLOGY AND PROCESS INTEGRATION FOR NANOPATTERNING XIII, 2024, 12958
  • [34] Diagnostics of inductively coupled chlorine plasmas:: Measurement of Cl2+ and Cl+ densities
    Malyshev, MV
    Fuller, NCM
    Bogart, KHA
    Donnelly, VM
    Herman, IP
    [J]. JOURNAL OF APPLIED PHYSICS, 2000, 88 (05) : 2246 - 2251
  • [35] Estimate of the negative ion density in reactive gas plasmas
    Shindo, M
    Ichiki, R
    Yoshimura, S
    Kawai, Y
    [J]. THIN SOLID FILMS, 2001, 390 (1-2) : 222 - 227
  • [36] Real-time feedback control of electron density in inductively coupled plasmas
    Chang, CH
    Leou, KC
    Lin, C
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (03): : 750 - 756
  • [37] Radial distributions of ion velocity, temperature, and density in ultrahigh-frequency, inductively coupled, and electron cyclotron resonance plasmas
    Nakano, T
    Samukawa, S
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (04): : 2065 - 2072
  • [38] GENERATION AND APPLICATION OF HIGH DENSITY LOW-FREQUENCY INDUCTIVELY COUPLED PLASMAS
    Xu, Shuyan
    Ostrikov, Kostya
    [J]. STATISTICAL PHYSICS, HIGH ENERGY, CONDENSED MATTER AND MATHEMATICAL PHYSICS, 2008, : 548 - 548
  • [39] Effect of electron energy distributions on the electron density in nitrogen inductively coupled plasmas
    Kim, Kwan-Yong
    Kim, Jung Hyung
    Chung, Chin-Wook
    Lee, Hyo-Chang
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (10):
  • [40] Experimental investigation of edge-to-center density ratio in inductively coupled plasmas
    Kim, Gun-Ho
    Lee, Hyo-Chang
    Chung, Chin-Wook
    [J]. PHYSICS OF PLASMAS, 2010, 17 (07)